The rate of agglomeration was measured for alumina particles with and without the copper in KNO3 at various pH values. For solutions without copper, agglomeration was greatest at pH of 7.5, near the isoelectric point of 6.5, at a rate of 82 nm/min, following a reaction-limited mechanism. Solutions with a pH away from the isoelectric point underwent reversible agglomeration, reaching a small agglomerate size at steady-state. The addition of copper did not affect agglomeration at pH 4. However, an increase in the agglomeration rates at pH 7.5 and 10 was observed with copper in the solutions, following a diffusion-limited mechanism
In this paper the influences of slurry chemistry and thickness of the copper layer on dishing will b...
The study reported herein indicated the stabilization mechanisms at work when copper-laden sludge is...
Despite a great thermodynamic driving force, copper cementation by aluminum from sulfate solutions i...
The rate of agglomeration of alumina particles in 1 mM KNO3 solutions with various additives with a ...
Chemical mechanical planarization (CMP) is a polishing process used during the manufacture of microe...
Chemical mechanical planarization (CMP) is used in integrated circuit manufacturing to remove excess...
[[abstract]]There are many kinds of commercial slurries used in Cu CMP. Major components include an ...
slurry have an important role for enhancing Cu removal rate. To understand the effects of complexing...
This study explores the effect of pH on the chemical mechanical polishing (CMP) characteristics of c...
The roles of H2O2 and alumina on the changes of metal removal rate, surface passivation and surface ...
Recent studies have been conducted investigating the effects of slurry chemistry on the copper CMP p...
Codeposition of a-alumina powder in an acidic copper plating solution was studied. We found the zeta...
ed in ble o particles (either alumina or fumed silica). The addition of Surface & Coatings Techn...
The present investigation was focused on understanding of the oxidation, dissolution and modificatio...
Sorption of copper and cadmium ions from aqueous solutions by ferric oxide particles was studied usi...
In this paper the influences of slurry chemistry and thickness of the copper layer on dishing will b...
The study reported herein indicated the stabilization mechanisms at work when copper-laden sludge is...
Despite a great thermodynamic driving force, copper cementation by aluminum from sulfate solutions i...
The rate of agglomeration of alumina particles in 1 mM KNO3 solutions with various additives with a ...
Chemical mechanical planarization (CMP) is a polishing process used during the manufacture of microe...
Chemical mechanical planarization (CMP) is used in integrated circuit manufacturing to remove excess...
[[abstract]]There are many kinds of commercial slurries used in Cu CMP. Major components include an ...
slurry have an important role for enhancing Cu removal rate. To understand the effects of complexing...
This study explores the effect of pH on the chemical mechanical polishing (CMP) characteristics of c...
The roles of H2O2 and alumina on the changes of metal removal rate, surface passivation and surface ...
Recent studies have been conducted investigating the effects of slurry chemistry on the copper CMP p...
Codeposition of a-alumina powder in an acidic copper plating solution was studied. We found the zeta...
ed in ble o particles (either alumina or fumed silica). The addition of Surface & Coatings Techn...
The present investigation was focused on understanding of the oxidation, dissolution and modificatio...
Sorption of copper and cadmium ions from aqueous solutions by ferric oxide particles was studied usi...
In this paper the influences of slurry chemistry and thickness of the copper layer on dishing will b...
The study reported herein indicated the stabilization mechanisms at work when copper-laden sludge is...
Despite a great thermodynamic driving force, copper cementation by aluminum from sulfate solutions i...