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Fast and high selectivity vapour phase etching techniques for silicon dioxide and silicon materials ...
Anhydrous HF vapor etching of sacrificial silicon dioxide thin films grown by plasma enhanced and lo...
The etching process on micropatterned Si (111) and silicon dioxide surfaces in 40% ammonium fluoride...
The gas phase etching of thermal silicon dioxide films was investigated with in situ Fourier Transfo...
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright...
This animation is provided by Maricopa Advanced Technology Education Center (MATEC) and shows the p...
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright...
Vapor HF etching of silicon dioxide for Si microstructure release. Microelectronic Engineering
Silicon dioxide is the most commonly used insulator material in IC technology and in the other field...
Silicon dioxide (SiO2) thin films are most widely used insulating films in the manufacture of silico...
The ClF gas spontaneously reacts with Si without gas discharge, regardl not rea at room ing wi layer...
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
Exploiting the higher etch probability for amorphous silicon relative to crystalline silicon, the tr...
A study of the etch characteristics of a thermally grown silicon dioxide etch in RITEs 2406 PLASMATR...
This is an open-access article distributed under the terms of the Creative Commons Attribution Non-C...
Fast and high selectivity vapour phase etching techniques for silicon dioxide and silicon materials ...
Anhydrous HF vapor etching of sacrificial silicon dioxide thin films grown by plasma enhanced and lo...
The etching process on micropatterned Si (111) and silicon dioxide surfaces in 40% ammonium fluoride...
The gas phase etching of thermal silicon dioxide films was investigated with in situ Fourier Transfo...
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright...
This animation is provided by Maricopa Advanced Technology Education Center (MATEC) and shows the p...
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright...
Vapor HF etching of silicon dioxide for Si microstructure release. Microelectronic Engineering
Silicon dioxide is the most commonly used insulator material in IC technology and in the other field...
Silicon dioxide (SiO2) thin films are most widely used insulating films in the manufacture of silico...
The ClF gas spontaneously reacts with Si without gas discharge, regardl not rea at room ing wi layer...
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
Exploiting the higher etch probability for amorphous silicon relative to crystalline silicon, the tr...
A study of the etch characteristics of a thermally grown silicon dioxide etch in RITEs 2406 PLASMATR...
This is an open-access article distributed under the terms of the Creative Commons Attribution Non-C...
Fast and high selectivity vapour phase etching techniques for silicon dioxide and silicon materials ...
Anhydrous HF vapor etching of sacrificial silicon dioxide thin films grown by plasma enhanced and lo...
The etching process on micropatterned Si (111) and silicon dioxide surfaces in 40% ammonium fluoride...