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flei a, ⇑ a a na gra p a chin diti ane fabr he arac dvanta carry, ental t haust acrosco imits t realiz an easy task. The conventional photolithography cannot provide sufficiently high resolution due to the limit of diffraction. For mod-ern nano-fabrication techniques, such as e-beam lithography [5], focused ion beam writing [6], near-field scanning optical micro-scopic lithography [7], although they can provide high-resolution nanometer patterns, they either suffer from slow speed or high cost for large-area fabrication. In this paper, we present a method In this section, we first fabricated a grating with traditional interference lithography method and then copied it by transparent material polydimethylsiloxane (PDMS) to make a soft grating mask. (The precursor and condenser are SYLGARD 184 and SYL-GARD(R) 184 SILICONE ELASTOMER CURING AGENT, respectively, which is provided by DOW CORNING CORPORATION, USA). Fig. 1 shows the interference schematic which composes of substrate (quartz), metal (chromium) layer with thickness of 60 nm and resist. After beam expansion and calibration, a continuous He–Cd laser (k = 441.6 nm) was split into two coherent beams by a bea