OPEN ACCESS JCPT Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature

Copyright © 2014 Satoshi Yamauchi et al. This is an open access article distributed under the Creative Commons Attribution Li-cense, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. In accordance of the Creative Commons Attribution License all Copyrights © 2014 are reserved for SCIRP and the owner of the intel-lectual property Satoshi Yamauchi et al. All Copyright © 2014 are guarded by law and by SCIRP as a guardian. Plasma-assisted chemical vapor deposition (PCVD) at pressure as low as 3 mtorr using titanium-tetra-isopro-poxide (TTIP) and oxygen mixed gas plasma generated by 13.56 MHz radio frequency power (RF-power) below 70 W were applied to deposit titanium-oxide layer at temperature under 40˚C. Plasma optical emission spec-troscopy and FTIR indicated that density of OH group in the amorphous layer was related to the density of OH or H2O in the plasma and the species was formed on electrode to induce the RF-power. Hydrophilicity on the layer was dependent on the density of chemisorbed OH, but was degraded by the excess OH. The PCVD-TiOx coating was demonstrated on polyethylene terephthalate and showed good hydrophilic property with the contact angle of water about 5˚