In this paper, the Quiet Direct Simulation (QDS) method is used to model the unsteady jet development in a Pulsed Pressure Chemical Vapour Deposition (PP-CVD) reactor. QDS is a novel method of gas flow simulation which is able to compute true-direction fluxes of mass, momentum and energy in a computationally efficient and accurate manner. The scheme is ideal for the simulation of novel CVD processes like PP-CVD which include highly unsteady flow structures and which has previously proved extremely difficult to simulate. Here, the axisymmetric QDS solver is outlined and the injection phase of a PP-CVD reactor is simulated
In this study various numerical schemes for simulating 2D laminar reacting gas flows, as typically f...
In this paper we present the simulation of a chemical vapor deposition for metallic bipolar plates. ...
After a long period of time during which CVD industrial reactors have been developed only by empiric...
In this paper, the Quiet Direct Simulation (QDS) method is used to model the unsteady jet developmen...
In this paper, a numerical model of the liquid precursor droplet flash evaporation and transport is ...
CVD systems require extensive engineering to produce uniform mass transport distribution across the ...
A model of the movement of precursor particles in the unsteady Pulsed-Pressure Chemical Vapour Depos...
Pulsed-CVD technology accomplishes reactant delivery by timed injection of gas into a continuously e...
International audienceThis article presents an approach for modeling the vaporization of droplets of...
Pulsed-CVD technology accomplishes reactant delivery by timed injection of gas into a continuously ...
This article presents an approach for modeling the vaporization of droplets of solvent and precurso...
This research is a study of the precursor mass transport, the first variable that affects the film ...
In this study various numerical schemes for simulating 2D laminar reacting gas flows, as typically f...
In production processes of micro-electronics, optical and mechanical coatings and solar cells, high-...
Over the past 40 years, the Direct Simulation Monte Carlo (DSMC) technique has been developed into a...
In this study various numerical schemes for simulating 2D laminar reacting gas flows, as typically f...
In this paper we present the simulation of a chemical vapor deposition for metallic bipolar plates. ...
After a long period of time during which CVD industrial reactors have been developed only by empiric...
In this paper, the Quiet Direct Simulation (QDS) method is used to model the unsteady jet developmen...
In this paper, a numerical model of the liquid precursor droplet flash evaporation and transport is ...
CVD systems require extensive engineering to produce uniform mass transport distribution across the ...
A model of the movement of precursor particles in the unsteady Pulsed-Pressure Chemical Vapour Depos...
Pulsed-CVD technology accomplishes reactant delivery by timed injection of gas into a continuously e...
International audienceThis article presents an approach for modeling the vaporization of droplets of...
Pulsed-CVD technology accomplishes reactant delivery by timed injection of gas into a continuously ...
This article presents an approach for modeling the vaporization of droplets of solvent and precurso...
This research is a study of the precursor mass transport, the first variable that affects the film ...
In this study various numerical schemes for simulating 2D laminar reacting gas flows, as typically f...
In production processes of micro-electronics, optical and mechanical coatings and solar cells, high-...
Over the past 40 years, the Direct Simulation Monte Carlo (DSMC) technique has been developed into a...
In this study various numerical schemes for simulating 2D laminar reacting gas flows, as typically f...
In this paper we present the simulation of a chemical vapor deposition for metallic bipolar plates. ...
After a long period of time during which CVD industrial reactors have been developed only by empiric...