MICROFABRICATION AND P LIGHT

We report on the micro-fa characterization of a chip-scale plasm based on a Rubidium (Rb) vapor cell. light source is intended for use as an in pump-light source in miniature doubl atomic clocks [1, 5]. The RF plasma coupled using external electrodes, and th impedance matched to the source between 1 and 36 MHz. Rb vapor c previously developed as reference cells f but not as light sources. This is the fi plasma emitted from a chip-scale devi emission is observed for over 18 days