Add to ORKGCopyright 2013 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial Licens
SIGLEAvailable from British Library Document Supply Centre-DSC:DXN017078 / BLDSC - British Library D...
This is an open-access article distributed under the terms of the Creative Commons Attribution Non-C...
Non-thermal plasma is regarded as a collection of free electrons, ions and neutral particles that ar...
Plasma process tools, which usually cost several millions of US dollars, are often used in the semic...
Sandia National Laboratories has developed a system to monitor plasma processes for control of indus...
Plasma etching and desmear processes for printed wiring board (PWB) manufacture are difficult to pre...
non-destructive and simple analytical method is provided which allows in situ monitoring of plasma d...
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright...
Abstract. The application of non-linear optical methods nowadays allows the measurement of an increa...
Optical diagnostics techniques based on coded imaging were developed and applied for plasma-related ...
In this note it is demonstrated that optical emission spectroscopy (OES) is an easy-to-implement and...
We propose a method for evaluating the hydrophilisation degree of low-k films upon plasma damage. Th...
A brief overview of non-perturbing light diagnostics is followed by recent examples of process plasm...
A survey is given of in-situ diagnostics of plasma and surface for application in plasma etching and...
SIGLEAvailable from British Library Document Supply Centre- DSC:DXN058913 / BLDSC - British Library ...
SIGLEAvailable from British Library Document Supply Centre-DSC:DXN017078 / BLDSC - British Library D...
This is an open-access article distributed under the terms of the Creative Commons Attribution Non-C...
Non-thermal plasma is regarded as a collection of free electrons, ions and neutral particles that ar...
Plasma process tools, which usually cost several millions of US dollars, are often used in the semic...
Sandia National Laboratories has developed a system to monitor plasma processes for control of indus...
Plasma etching and desmear processes for printed wiring board (PWB) manufacture are difficult to pre...
non-destructive and simple analytical method is provided which allows in situ monitoring of plasma d...
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright...
Abstract. The application of non-linear optical methods nowadays allows the measurement of an increa...
Optical diagnostics techniques based on coded imaging were developed and applied for plasma-related ...
In this note it is demonstrated that optical emission spectroscopy (OES) is an easy-to-implement and...
We propose a method for evaluating the hydrophilisation degree of low-k films upon plasma damage. Th...
A brief overview of non-perturbing light diagnostics is followed by recent examples of process plasm...
A survey is given of in-situ diagnostics of plasma and surface for application in plasma etching and...
SIGLEAvailable from British Library Document Supply Centre- DSC:DXN058913 / BLDSC - British Library ...
SIGLEAvailable from British Library Document Supply Centre-DSC:DXN017078 / BLDSC - British Library D...
This is an open-access article distributed under the terms of the Creative Commons Attribution Non-C...
Non-thermal plasma is regarded as a collection of free electrons, ions and neutral particles that ar...