ORI GIN AL PA PER Simulation of Excimer Ultraviolet (EUV) Emission from a Coaxial Xenon Excimer Ultraviolet Lamp Driven by Distorted Bipolar Square Voltages

Abstract Simulation of excimer ultraviolet (EUV) emission from a coaxial xenon excimer ultraviolet lamp driven by distorted bipolar square voltages is presented in this study. A self-consistent radial one-dimensional fluid model, considering local mean energy approximation (LMEA), along with a set of simplified xenon plasma chemistry was employed to simulate the discharge physics and chemistry. Emitted powers of EUV light and deposited powers to the charged species were simulated by varying the values of four key parameters, which include the driving frequency, gas pressure, gap distance and number of dielectric layers. Results show that there are three distinct periods that include pre-discharge, discharge and post-discharge ones. It is found that intensive EUV (172 nm) emission occurs during the early part of the discharge period, which correlates very well in time with the power deposition through electrons. In addition, power deposition through Xeþ and Xeþ2 occurs mainly in the discharge period and later part of discharge period, respectively. Surprisingly, the emission efficiency of 172 nm increases slightly with increasing driving frequency of power source, while it increases dramatically with increasing gap distance. In addition, the maximal emission efficiency is found to take place at gas pressure of 600 torr. The emission efficiency of one-dielectric case is found to be better than that of two-dielectric one. The underlying mechanisms in the above observa-tions are discussed in detail in the paper