S....) Mechanical design of microfabricated devices requires knowledge of mechanical material properties. Thin film material properties are sensitively process dependent, and should therefore be organized accordingly. A relational database of material properties is under development as part of a general micro-electro-mechanical-EAD environment. A computerized literature search through the published values for Silicon Nitride (Si3N") properties under various processing conditions resulted in the following document. /
Silicon nitride (Si3N4) is an important thin film materials in the construction of micromachined dev...
A novel microbridge testing method for thin films is proposed. Theoretic analysis and finite element...
This paper reports nanostructural characteristics and mechanical properties of the PECVD silicon nit...
6 pages, 7 figures, 1 table.Silicon nitride thin films were prepared by reactive sputtering from dif...
Identification of alfa- and beta-phases of Si3N4 single crystals grown from Si melt could be made wi...
The optimization of microelectronic devices and Microelectromechanical Systems (MEMS) technology dep...
This research aims at analyzing the effective mechanical properties of thin film materials that are ...
Materials and mechanical characteristics of the low temperature PECVD silicon nitrides have been inv...
An experimental investigation of mechanical properties of thin films using nanoindentation was repor...
Thin films play a key role in the material science of microelectronics, and the subject matter of th...
This paper reports the characterization of low temperature PECVD thin films as structural materials ...
The effect of deposition conditions on characteristic mechanical properties – elastic modulus and ha...
Silicon nitride thin film dielectrics are used in capacitive radio frequency micro-electromechanical...
Silicon nitride and silicon oxynitride thin films are widely used in microelectronic fabrication and...
The measurement of mechanical properties of thin films is a major issue for the design of reliable m...
Silicon nitride (Si3N4) is an important thin film materials in the construction of micromachined dev...
A novel microbridge testing method for thin films is proposed. Theoretic analysis and finite element...
This paper reports nanostructural characteristics and mechanical properties of the PECVD silicon nit...
6 pages, 7 figures, 1 table.Silicon nitride thin films were prepared by reactive sputtering from dif...
Identification of alfa- and beta-phases of Si3N4 single crystals grown from Si melt could be made wi...
The optimization of microelectronic devices and Microelectromechanical Systems (MEMS) technology dep...
This research aims at analyzing the effective mechanical properties of thin film materials that are ...
Materials and mechanical characteristics of the low temperature PECVD silicon nitrides have been inv...
An experimental investigation of mechanical properties of thin films using nanoindentation was repor...
Thin films play a key role in the material science of microelectronics, and the subject matter of th...
This paper reports the characterization of low temperature PECVD thin films as structural materials ...
The effect of deposition conditions on characteristic mechanical properties – elastic modulus and ha...
Silicon nitride thin film dielectrics are used in capacitive radio frequency micro-electromechanical...
Silicon nitride and silicon oxynitride thin films are widely used in microelectronic fabrication and...
The measurement of mechanical properties of thin films is a major issue for the design of reliable m...
Silicon nitride (Si3N4) is an important thin film materials in the construction of micromachined dev...
A novel microbridge testing method for thin films is proposed. Theoretic analysis and finite element...
This paper reports nanostructural characteristics and mechanical properties of the PECVD silicon nit...