O EDP Sciences, Les Ulis CVD deposition of cobalt oxide (C0304) from Co(aca~)~

Abstract. Cobalt oxides are interesting materials for catalytic applications. Their deposition by CVD methods, however, have been rarely studied to date. In this work, cobalt(I1)-acetylacetonate, Co(aca~)~, was used as metal-organic precursor together with oxygen, to deposit Cojo4 on steel and silicon dioxide substrates in an atmospheric cold-wall CVD reactor. The morphology and growth rate as a finction of temperature, flow rate and oxygen partial pressure was studied. Growth was found between 200 and 500 "C. The samples were analysed by SEM, UV-Vis spectroscopy and XRD. The morphology as well as the growth rate may be varied in a wide parameter range fiom smooth films to dendritic growth. Some samples were also tested for their catalytic activity in propane oxidation.