Add to ORKGŽ.Ti,Al,Si N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents in the range 211 at. % and Ž.Al contents between 4 and 19 at.%. Samples prepared in rotation mode three magnetrons presented densities between 4.0 and 3 Ž.4.6 gcm, while samples prepared in static mode magnetron with Ti target with small pieces of Si and Al displayed densities mainly in the range 3.03.9 gcm3. For comparison purposes, the evaluation of Young’s modulus was performed by both Ž.depth-sensing indentation and surface acoustic wave SAW techniques. Indentation results revealed systematically higher values than those obtained by SAW. These discrepancies might be related with the relatively low density of the films. Hardness values of...
This paper describes the nanoindentation behavior of TiVCrZrAl nitride films grown on Si substrates ...
Physical or chemical vapor deposited nanocomposite thin films evoke much scientific interest due to ...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
ŽTi,Al,Si.N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon a...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Ti1yxSixNy films with Si contents up to 17.5 at.% and N contents close to 50 at.% were prepared by r...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
This paper reports on the optimization of coating properties to improve the performance of tools in ...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target w...
New superhard Ti-Al-Si-N films, characterized by a nanocomposite comprising nano-sized (Ti,Al,Si)N c...
This paper describes the nanoindentation behavior of TiVCrZrAl nitride films grown on Si substrates ...
Physical or chemical vapor deposited nanocomposite thin films evoke much scientific interest due to ...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
ŽTi,Al,Si.N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
(Ti,Si,Al)N nanocomposite coatings with different Ti, Si, Al contents, were deposited onto silicon a...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Ti1yxSixNy films with Si contents up to 17.5 at.% and N contents close to 50 at.% were prepared by r...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
This paper reports on the optimization of coating properties to improve the performance of tools in ...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target w...
New superhard Ti-Al-Si-N films, characterized by a nanocomposite comprising nano-sized (Ti,Al,Si)N c...
This paper describes the nanoindentation behavior of TiVCrZrAl nitride films grown on Si substrates ...
Physical or chemical vapor deposited nanocomposite thin films evoke much scientific interest due to ...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...