Increasing variability during manufacturing and during runtime are projected for future generation microprocessors. This paper intro-duces a pre-RTL, architectural modeling methodology that incor-porates the impact of manufacturing and runtime temperature vari-ations on delay and power for both combinational logic and SRAM structures. The model is then used to show that frequency varia-tions among microarchitectural functional units and among cores are relatively small in a high-performance microprocessor design. However, the impact of within-die systematic process variations on leakage power will result in major leakage variation across multiple cores on a single chip. WID leakage variation can cause core-to-core leakage to differ by as mu...
ILITY, CONCENTRATING ON GATE LENGTH AND ON-CHIP TEMPERATURE VARIATIONS. TO ASSESS THE EFFECT OF MI...
The dominance of leakage currents in circuit design has been impelled by steady downscaling of MOSFE...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
Increasing variability during manufacturing and during runtime are projected for future generation m...
This paper proposes microarchitecture-level models for Within Die (WID) process and system parameter...
Design variability due to inter-die (D2D) and intra-die (WID) process variations has the potential t...
Multi-core architectures introduce a new granularity at which process variations may occur, yielding...
supply voltage is only slightly higher than the threshold voltage of transistors, is a promising app...
As integrated-circuit technology continues to scale, process variation is becoming an issue that can...
Parameter variations, which are increasing along with advances in process technologies, affect both...
The continued scaling of semiconductor technologies leads to diverse challenges such as power and te...
PhD ThesisThe effect of manufacturing process variations has become a major issue regarding the esti...
Abstract—This paper presents a novel framework for accurate estimation of key statistical parameters...
We describe the impact of process variation on leakage power for a 0.18µm CMOS technology. We show t...
Continued scaling of semiconductor technology has greatly increased the complexity of the manufactur...
ILITY, CONCENTRATING ON GATE LENGTH AND ON-CHIP TEMPERATURE VARIATIONS. TO ASSESS THE EFFECT OF MI...
The dominance of leakage currents in circuit design has been impelled by steady downscaling of MOSFE...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
Increasing variability during manufacturing and during runtime are projected for future generation m...
This paper proposes microarchitecture-level models for Within Die (WID) process and system parameter...
Design variability due to inter-die (D2D) and intra-die (WID) process variations has the potential t...
Multi-core architectures introduce a new granularity at which process variations may occur, yielding...
supply voltage is only slightly higher than the threshold voltage of transistors, is a promising app...
As integrated-circuit technology continues to scale, process variation is becoming an issue that can...
Parameter variations, which are increasing along with advances in process technologies, affect both...
The continued scaling of semiconductor technologies leads to diverse challenges such as power and te...
PhD ThesisThe effect of manufacturing process variations has become a major issue regarding the esti...
Abstract—This paper presents a novel framework for accurate estimation of key statistical parameters...
We describe the impact of process variation on leakage power for a 0.18µm CMOS technology. We show t...
Continued scaling of semiconductor technology has greatly increased the complexity of the manufactur...
ILITY, CONCENTRATING ON GATE LENGTH AND ON-CHIP TEMPERATURE VARIATIONS. TO ASSESS THE EFFECT OF MI...
The dominance of leakage currents in circuit design has been impelled by steady downscaling of MOSFE...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...