Add to ORKGDesign, synthesis and characterization of poly(trimethylsilylmethyl methacrylate-co-chloromethyl styrene) for 193-nm exposur
Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 19...
A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and ...
A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and ...
Requirements of materials for lithography at 193 am limit single layer resist candidates to those wi...
The living poly(styryl)lithium was synthesized by anionic polymerization with the protection of argo...
We have developed a Quantitative Structure Property Relationship (QSPR) model for predicting the ref...
Poly[(methacrylic acid tert-butyl cholate ester)-co-(??-butyrolactone- 2-yl methacrylate)] was synth...
SIGLECNRS TD 15536 / INIST-CNRS - Institut de l'Information Scientifique et TechniqueFRFranc
peer reviewedBlock copolymers of polymethylphenylsilane (PMPS) and polystyrene (PS) have been succes...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
Novel arborescent block copolymers comprising of an arborescent rubbery polyisobutylene (PIB) midseg...
Novel arborescent block copolymers comprising of an arborescent rubbery polyisobutylene (PIB) midseg...
Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 19...
A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and ...
A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and ...
Requirements of materials for lithography at 193 am limit single layer resist candidates to those wi...
The living poly(styryl)lithium was synthesized by anionic polymerization with the protection of argo...
We have developed a Quantitative Structure Property Relationship (QSPR) model for predicting the ref...
Poly[(methacrylic acid tert-butyl cholate ester)-co-(??-butyrolactone- 2-yl methacrylate)] was synth...
SIGLECNRS TD 15536 / INIST-CNRS - Institut de l'Information Scientifique et TechniqueFRFranc
peer reviewedBlock copolymers of polymethylphenylsilane (PMPS) and polystyrene (PS) have been succes...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
The synthesis of a functional polysilane, alpha,omega-dichloro-polymethylphenylsilane (alpha,omega-d...
Novel arborescent block copolymers comprising of an arborescent rubbery polyisobutylene (PIB) midseg...
Novel arborescent block copolymers comprising of an arborescent rubbery polyisobutylene (PIB) midseg...
Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 19...
A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and ...
A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and ...