We explore the possibility of using solid-electrolytes as active materials for non-volatile memory devices. We show that large ionic concentrations can be reversibly induced and then depleted using field effect in Cu2S thin films. Conditions needed to grow/etch nanowires in solid-electrolytes are also discussed. The field-induced ionic conductivities does not involve oxidation/reduction of Cu++ while nanowire growth/etch does. We discuss retention issues, write/erase speed and other related parameters in Cu2S and other SE such as Ag2S and CuI. Interestingly, it is easier to grow/etch nanowires in Ag2S than in Cu2S. Similarities and differences between electronic and optical reduction/oxidation in SE and silver halides are also discussed
<p>Cu<sub>2</sub>Se nanoflake arrays supported by Cu foams are synthesized by a facile hydrothermal ...
It has been reported that in chalcogenide-based electrochemical metallization (ECM) memory cells (e....
Due to the mainstream CMOS technology facing a rapid approach to the fundamental downscaling limit, ...
Reversible and reproducible formation and dissolution of silver conductive filaments are studied in ...
Filament Memories based on resistive switching have been attracting attention in recent years as a p...
With the ever decreasing size of electronic components, there is a continuous necessity to make ever...
Resistive switching memories allow electrical control of the conductivity of a material, by inducing...
Reversible and reproducible formation and dissolution of silver conductive filaments are studied in ...
New memory technologies must be easily integrable into standard semiconductor processes and allow fo...
Amorphous semiconductors with tailored ionic and electronic conductivities are central to the operat...
Resistive switching memories have gained an increased interest due to the possibilities for downscal...
Programmable Metallization Cell (PMC) memory devices are a growing alternative that offers the same ...
© 2017, The Author(s). Atom-probe tomography of Ag-photodoped amorphous thin-film Ge 40 S 60 , the m...
Prediction from the dual-phase nature of superionic conductors-both solid and liquid-like-is that mo...
The switching behaviors of ionic/electronic mixed conductor-based solid electrolyte nonvolatile memo...
<p>Cu<sub>2</sub>Se nanoflake arrays supported by Cu foams are synthesized by a facile hydrothermal ...
It has been reported that in chalcogenide-based electrochemical metallization (ECM) memory cells (e....
Due to the mainstream CMOS technology facing a rapid approach to the fundamental downscaling limit, ...
Reversible and reproducible formation and dissolution of silver conductive filaments are studied in ...
Filament Memories based on resistive switching have been attracting attention in recent years as a p...
With the ever decreasing size of electronic components, there is a continuous necessity to make ever...
Resistive switching memories allow electrical control of the conductivity of a material, by inducing...
Reversible and reproducible formation and dissolution of silver conductive filaments are studied in ...
New memory technologies must be easily integrable into standard semiconductor processes and allow fo...
Amorphous semiconductors with tailored ionic and electronic conductivities are central to the operat...
Resistive switching memories have gained an increased interest due to the possibilities for downscal...
Programmable Metallization Cell (PMC) memory devices are a growing alternative that offers the same ...
© 2017, The Author(s). Atom-probe tomography of Ag-photodoped amorphous thin-film Ge 40 S 60 , the m...
Prediction from the dual-phase nature of superionic conductors-both solid and liquid-like-is that mo...
The switching behaviors of ionic/electronic mixed conductor-based solid electrolyte nonvolatile memo...
<p>Cu<sub>2</sub>Se nanoflake arrays supported by Cu foams are synthesized by a facile hydrothermal ...
It has been reported that in chalcogenide-based electrochemical metallization (ECM) memory cells (e....
Due to the mainstream CMOS technology facing a rapid approach to the fundamental downscaling limit, ...