Add to ORKGWe have previously used an ultraviolet laser to rapidly (3000A/min) photodeposit near stoichiometric SiO 2 at low temperatures (200 ~ by photodissociation of N20 an
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
We have prepared SiO2 and GeO2 thin films from tetraethoxyorthosilicate (TEOS; Si(OC2H5)4) and tetra...
We have prepared SiO2 and GeO2 thin films from tetraethoxyorthosilicate (TEOS; Si(OC2H5)4) and tetra...
grantor: University of TorontoThe short-wavelength extension of pulsed-laser deposition (P...
grantor: University of TorontoThe short-wavelength extension of pulsed-laser deposition (P...
Polysiloxane layers were deposited from the gas phase by photoinduced polymerization reaction of tet...
Multicomponent films like ITO (indium tin oxide) and silica (SiO2) can be efficiently deposited by u...
UV transparent phase masks are used in various laser applications like fabrication of Bragg gratings...
Excimer-laser-induced CVD methods have been used for the fabrication of SiO_2 and Ta_2O_5 thin films...
AbstractUltra-short pulse lasers can be applied for fast and precise structuring of thin passivating...
ABSTRACT The localized laser-induced deposition of an insulator for silicon-based microelectronics s...
After a short overview about the different techniques of the SiO2-formation by photo-induced methods...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
We have prepared SiO2 and GeO2 thin films from tetraethoxyorthosilicate (TEOS; Si(OC2H5)4) and tetra...
We have prepared SiO2 and GeO2 thin films from tetraethoxyorthosilicate (TEOS; Si(OC2H5)4) and tetra...
grantor: University of TorontoThe short-wavelength extension of pulsed-laser deposition (P...
grantor: University of TorontoThe short-wavelength extension of pulsed-laser deposition (P...
Polysiloxane layers were deposited from the gas phase by photoinduced polymerization reaction of tet...
Multicomponent films like ITO (indium tin oxide) and silica (SiO2) can be efficiently deposited by u...
UV transparent phase masks are used in various laser applications like fabrication of Bragg gratings...
Excimer-laser-induced CVD methods have been used for the fabrication of SiO_2 and Ta_2O_5 thin films...
AbstractUltra-short pulse lasers can be applied for fast and precise structuring of thin passivating...
ABSTRACT The localized laser-induced deposition of an insulator for silicon-based microelectronics s...
After a short overview about the different techniques of the SiO2-formation by photo-induced methods...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
In this paper we report on the use of expanding thermal plasma technique for the deposition of carbo...
We have prepared SiO2 and GeO2 thin films from tetraethoxyorthosilicate (TEOS; Si(OC2H5)4) and tetra...
We have prepared SiO2 and GeO2 thin films from tetraethoxyorthosilicate (TEOS; Si(OC2H5)4) and tetra...