A process for forming a thin metal coating on a substrate wherein a gas stream heated by an electrical current impinges on a metallic target in a vacuum chamber to form a molten pool of the metal and then vaporize a portion of the pool, with the source of the heated gas stream being on one side of the target and the substrate being on the other side of the target such that most of the metallic vapor from the target is directed at the substrate
DE 10018639 C UPAB: 20010603 NOVELTY - Process for ion-promoted high rate vaporization of a substrat...
In developing of new processes for growing metal (composite) films, the main attention is given to c...
AbstractThis paper proposes a novel process for electrochemical engraving of metals without a need f...
A vapor deposition process has been defined through a spinoff effort of space welding development. I...
Improved apparatus enables vacuum deposition of thick metal films on the inside surface of a cylinde...
A gas/arc electrode is disclosed for use under vacuum conditions where a first housing encloses a se...
Mechanism using a helix sequentially feeds prescribed amounts of metal charges into an evaporation b...
Thin metal (e.g., Al, Cu, Ag) and metal oxide films (e.g., SiOx, AlyOx, SnyOx) were deposited on syn...
Deposition of uniform coatings in the vacuum arc deposition setup has been investigated. A control u...
The method comprises depositing a metal layer on the surface of the substrate under vacuum with an e...
Main modeling challenges for vacuum arc remelting (VAR) are briefly highlighted concerning various i...
he method for vapor deposition of a substrate (2) within a vacuum chamber (1), comprises evaporating...
Ion plating deposits thin film on complex surface in one operation. The ionized materials follow ele...
Continuous efforts to further increase the performance of microelectronic circuits challenge all of ...
Plānu pārklājumu uzklāšana uz dažādiem izstrādājumiem tiek izmantota daudzās tehnikas nozarēs. Magne...
DE 10018639 C UPAB: 20010603 NOVELTY - Process for ion-promoted high rate vaporization of a substrat...
In developing of new processes for growing metal (composite) films, the main attention is given to c...
AbstractThis paper proposes a novel process for electrochemical engraving of metals without a need f...
A vapor deposition process has been defined through a spinoff effort of space welding development. I...
Improved apparatus enables vacuum deposition of thick metal films on the inside surface of a cylinde...
A gas/arc electrode is disclosed for use under vacuum conditions where a first housing encloses a se...
Mechanism using a helix sequentially feeds prescribed amounts of metal charges into an evaporation b...
Thin metal (e.g., Al, Cu, Ag) and metal oxide films (e.g., SiOx, AlyOx, SnyOx) were deposited on syn...
Deposition of uniform coatings in the vacuum arc deposition setup has been investigated. A control u...
The method comprises depositing a metal layer on the surface of the substrate under vacuum with an e...
Main modeling challenges for vacuum arc remelting (VAR) are briefly highlighted concerning various i...
he method for vapor deposition of a substrate (2) within a vacuum chamber (1), comprises evaporating...
Ion plating deposits thin film on complex surface in one operation. The ionized materials follow ele...
Continuous efforts to further increase the performance of microelectronic circuits challenge all of ...
Plānu pārklājumu uzklāšana uz dažādiem izstrādājumiem tiek izmantota daudzās tehnikas nozarēs. Magne...
DE 10018639 C UPAB: 20010603 NOVELTY - Process for ion-promoted high rate vaporization of a substrat...
In developing of new processes for growing metal (composite) films, the main attention is given to c...
AbstractThis paper proposes a novel process for electrochemical engraving of metals without a need f...