P6.4 MEMS technology for production of different micro- and nanodevices

To obtain of different microdevices apply techniques such as LIGA, surface and bulk micromashinning of silicon. However, they either can not provide a wide range of microstructures, or extremely expensive because they require special equipment and materials. It therefore remains an urgent problem and develop a universal low-cost technology, which will generate different kinds of microdevices on wide range of sizes that can work at high thermal and mechanical loads. The proposed technology based on the processes of electrochemical oxidation of aluminum and bulk etching of the thus obtained oxide. The initial thickness of the aluminum plate is selected commensurate with the thickness of the insulating products to reduce time and expense of materials during etching of unreacted aluminum. Grown aluminum oxide layer, depending on the used electrolyte and anodizing conditions can have a thickness from tenths to several hundred micrometers. Due to the availability of selective etchants for aluminum and their oxide, the grown layers of anodic alumina can be easily obtained in the free form of aluminum. In the initial state anodic alumina is in amorphous phase. When heated above 800 °C oxide transforms into a polycrystalline phase, which is characterized by a number of structural phases with specific physical-chemical and mechanical properties. Satisfactory electrical and mechanical propertie