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The work presented in this paper potrays the working of NOT logic gate which is implemented using the 2D photonic crystal instead of using conventional semiconductor devices. The gate fabricated is implemented on a air wafer of 12µm x 12µm.The dielectric used is silicon to fabricate the rods of the radius =0.2a where ‘a ’ is the lattice constant taken as 0.11886µm.The refractive index of silicon = 3.39.The square lattice of gate implemented is simulated on the wavelength of 1.7µm using finite difference time domain method using the tool opti FDTD