As scaling of conventional metal-oxide-semiconductor field effect transistor is approaching its fundamental and technological limits, alternate device solutions are being developed. FinFET is rapidly replacing conventional CMOS transistors as it offer lot of improvements in power consumption, propagation delay and propagation delay product (PDP). This paper presents design & simulation of a double gate FinFET based ultra low power 2-bit Carry Save Adder (CSA) cell. A comprehensive comparison of FinFET and CMOS based 2-bit carry save adder has been performed. The CMOS & FinFET based 2-bit carry save adder circuits are evaluated at 32nm & 45nm nanoscale technology nodes using Predictive Technology Models (PTM). At 45nm technology ...
The 21st century is witnessing a tremendous demand for transistors. Life amenities have incorporated...
Miniaturization and portable devices have reshaped the electronic device landscape, emphasizing the ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The scaling process of the conventional 2D-planar metal-oxide semiconductor field-effect transistor ...
FinFET at 32 nm and beyond is an emerging transistor technology offer interesting delay–power trade...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
FinFET is a non planar modeling device for small size transistors (less than 45nm) will replace trad...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
Planar Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) have been leading the semiconduc...
The Semiconductor industry has excelled the electronics market in providing high speed, power effici...
The Semiconductor industry has excelled the electronics market in providing high speed, power effici...
FINFET terminological in exactitude process reuses a massive part of well accustomed conventional CM...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
Abstract — A FinFET, a novel double-gate device structure is capable of scaling well into the nanoel...
Adder is the most important arithmetic block that are used in all processors. Most of the logical ci...
The 21st century is witnessing a tremendous demand for transistors. Life amenities have incorporated...
Miniaturization and portable devices have reshaped the electronic device landscape, emphasizing the ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...
The scaling process of the conventional 2D-planar metal-oxide semiconductor field-effect transistor ...
FinFET at 32 nm and beyond is an emerging transistor technology offer interesting delay–power trade...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
FinFET is a non planar modeling device for small size transistors (less than 45nm) will replace trad...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
Planar Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) have been leading the semiconduc...
The Semiconductor industry has excelled the electronics market in providing high speed, power effici...
The Semiconductor industry has excelled the electronics market in providing high speed, power effici...
FINFET terminological in exactitude process reuses a massive part of well accustomed conventional CM...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
Abstract — A FinFET, a novel double-gate device structure is capable of scaling well into the nanoel...
Adder is the most important arithmetic block that are used in all processors. Most of the logical ci...
The 21st century is witnessing a tremendous demand for transistors. Life amenities have incorporated...
Miniaturization and portable devices have reshaped the electronic device landscape, emphasizing the ...
The high-k is needed to replace SiO2 as the gate dielectric to reduce the gate leakage current. The ...