C 2014 American Chemical Society Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist

ne challenge in nanofabrication is to pattern on nonflat or prestruc-tured surfaces, which is desired in many fields such as MEMS,1 electronic devices,2 superadhesive surfaces,3 and op-tical devices.4 For example, nanopatterning on optical fibers allows the so-called lab-on-fiber technology,5 and that on an atomic force microscope (AFM) tip allows tip-enhanced Raman spectroscopy,6 near-field optical focusing,7,8 and the study of funda-mental quantum mechanical systems.9,10 In addition, nanofabrication on a cylindrical roller may be needed as the mold for roll-to-roll nanoimprint lithography (NIL).11,1