Abstract—VLSI systems in the nanometer regime suffer from high defect rates and large parametric variations that lead to yield loss as well as reduced reliability of operation. An architec-tural framework that ensures proper system operation when few functional units are defective or unreliable under process-induced or temporal parametric variations can be effective in improving manufacturing yield and overall system reliability. In this paper, we propose a novel memory-based computational framework that exploits the on-chip memory to perform computation on demand using a lookup table (LUT)-based approach. The framework achieves reliable operation by transferring activity to embedded memory of a processor from a defective or unreliable func...
Negative bias temperature instability (NBTI) is a major cause of concern for chip designers because ...
The continued scaling of silicon fabrication technologies has enabled the integration of dozens of p...
As the semiconductor process technology continues to scale deeper into the nanometer region, the int...
VLSI systems in the nanometer regime suffer from high defect rates and large parametric variations t...
The continued increase in microprocessor clock frequency that has come from advancements in fabricat...
Process parameter variations are expected to be significantly high in a sub-50-nm technology regime,...
Ever decreasing device size causes more frequent hard faults, which becomes a serious burden to proc...
Reliability is a fundamental challenge for current and future microprocessors with advanced nanoscal...
In this thesis, we have investigated the impact of parametric variations on the behaviour of one per...
As device density grows, each transistor gets smaller and more fragile leading to an overall higher ...
Abstract—This paper proposes a new fault tolerant cache organ-ization capable of dynamically mapping...
Abstract — An increasing number of hardware failures can be attributed to device reliability problem...
Presence of high defect rate in nanofabrics due to the inadequate fabrication processes has held bac...
textSilicon reliability has reemerged as a very important problem in digital system design. As volta...
As technology feature size continues to shrink, we see two challenging problems in the design of com...
Negative bias temperature instability (NBTI) is a major cause of concern for chip designers because ...
The continued scaling of silicon fabrication technologies has enabled the integration of dozens of p...
As the semiconductor process technology continues to scale deeper into the nanometer region, the int...
VLSI systems in the nanometer regime suffer from high defect rates and large parametric variations t...
The continued increase in microprocessor clock frequency that has come from advancements in fabricat...
Process parameter variations are expected to be significantly high in a sub-50-nm technology regime,...
Ever decreasing device size causes more frequent hard faults, which becomes a serious burden to proc...
Reliability is a fundamental challenge for current and future microprocessors with advanced nanoscal...
In this thesis, we have investigated the impact of parametric variations on the behaviour of one per...
As device density grows, each transistor gets smaller and more fragile leading to an overall higher ...
Abstract—This paper proposes a new fault tolerant cache organ-ization capable of dynamically mapping...
Abstract — An increasing number of hardware failures can be attributed to device reliability problem...
Presence of high defect rate in nanofabrics due to the inadequate fabrication processes has held bac...
textSilicon reliability has reemerged as a very important problem in digital system design. As volta...
As technology feature size continues to shrink, we see two challenging problems in the design of com...
Negative bias temperature instability (NBTI) is a major cause of concern for chip designers because ...
The continued scaling of silicon fabrication technologies has enabled the integration of dozens of p...
As the semiconductor process technology continues to scale deeper into the nanometer region, the int...