Much progress has been made towards the understanding and elimination of the Fermi level pin-ning problem at compound.semiconductor surfaccs aml interfaces. This progress includes the dis-covery of several new techniques for reducing and controlling the surface st;lie density and the achievement of metal work function dominated barrier heights at metal/(100) Ga As interfaces. This paper will review this work and the relevance of various Fermi level pinning thcoties to these re-sults. IN'FROD!/(."I'I()N The development of comlx, und semiconductor devices has been hampered by the presence of an appreciable density of uncontrolled surface states, who ~ origin is still a topic of controversy. These states tend to "pin "...
It is well known that the electrical properties of metal/p-Ge junctions show Ohmic behavior [1, 2], ...
Fermi level (FL) pinning at the Ge valence band results in a high Schottky barrier height for all me...
The Fermi-level pinning (FLP) at the metal/high-k interface and its dependence on the electron state...
Recent experiments, involving thin coverage of metal atoms on III-V semiconductors, suggest that the...
We have investigated the phenomenon of Fermi-level pinning by charged defects at the semiconductor-m...
There have been several recent reports of barrier height studies on metal-semiconductor interfaces. ...
The position of the Fermi level at a metal-semiconductor interface relative to the conduction band h...
A new mechanism for the Fermi-level pinning at semiconductor surfaces is proposed. It is based on co...
Fermi-level pinning behavior has been observed at the free surface, oxide interface, metal interface...
A theoretical analysis is presented for the combination of stoichiometry changes within a metal cont...
Surface and interface recombination processes, which are becoming more and more important with the a...
A new mechanism for the Fermi-level pinning at semiconductor surfaces is proposed. It is based on co...
Substances are usually classified according to their electrical conductivity as conductors, insulato...
The atomic structure of interfaces between conducting electrodes and molecular organic materials var...
Understanding the electron transport through transition-metal dichalcogenide (TMDC)-based semiconduc...
It is well known that the electrical properties of metal/p-Ge junctions show Ohmic behavior [1, 2], ...
Fermi level (FL) pinning at the Ge valence band results in a high Schottky barrier height for all me...
The Fermi-level pinning (FLP) at the metal/high-k interface and its dependence on the electron state...
Recent experiments, involving thin coverage of metal atoms on III-V semiconductors, suggest that the...
We have investigated the phenomenon of Fermi-level pinning by charged defects at the semiconductor-m...
There have been several recent reports of barrier height studies on metal-semiconductor interfaces. ...
The position of the Fermi level at a metal-semiconductor interface relative to the conduction band h...
A new mechanism for the Fermi-level pinning at semiconductor surfaces is proposed. It is based on co...
Fermi-level pinning behavior has been observed at the free surface, oxide interface, metal interface...
A theoretical analysis is presented for the combination of stoichiometry changes within a metal cont...
Surface and interface recombination processes, which are becoming more and more important with the a...
A new mechanism for the Fermi-level pinning at semiconductor surfaces is proposed. It is based on co...
Substances are usually classified according to their electrical conductivity as conductors, insulato...
The atomic structure of interfaces between conducting electrodes and molecular organic materials var...
Understanding the electron transport through transition-metal dichalcogenide (TMDC)-based semiconduc...
It is well known that the electrical properties of metal/p-Ge junctions show Ohmic behavior [1, 2], ...
Fermi level (FL) pinning at the Ge valence band results in a high Schottky barrier height for all me...
The Fermi-level pinning (FLP) at the metal/high-k interface and its dependence on the electron state...