Abstract — We investigate the effect of a single charge trap random telegraph noise (RTN)-induced degradation in III–V heterojunction tunnel FET (HTFET)-based SRAM. Our analysis focuses on Schmitt trigger (ST) mechanism-based variation tolerant ten-transistor SRAM. We compare iso-area SRAM cell configurations in Si-FinFET and HTFET. Our results show that HTFET ST SRAMs provide significant energy/performance enhancements even in the presence of RTN. For sub-0.2 V operation (Vcc), HTFET ST SRAM offers 15 % improvement in read-write noise margins along with better variation immunity from RTN over Si-FinFET ST SRAM. A comparison with iso-area 6T Si-FinFET SRAM with wider size transistors shows 43 % improved read noise margin in 10T HTFET ST SRA...
The low frequency noise (LFN) mechanisms of TFETs with different source junction design are experime...
session: SOI Circuit DesignInternational audienceThis work investigates the impact of Random Telegra...
Abstract — One of the key challenges in scaling beyond 10-nm technology node is device-to-device var...
Abstract — We present an analysis of electrical noise in III–V heterojunction TFET (HTFET). Using nu...
Abstract — This paper analyzes the impacts of a single acceptor-type and donor-type interface trap i...
are promising candidates for low supply voltage applications with higher switching performance than ...
As one of the important sources of lowfrequency noise, random telegraph noise (RTN) in tunnel FET (T...
In this paper, multi-phonon transition model of RTN in FinFETs with statistical distribution is inte...
session A7L-E: Advanced CMOSInternational audienceThis work investigates the impact of Random Telegr...
In this paper, multi-phonon transition model of RTN in FinFETs with statistical distribution is inte...
Since devices actually operate under AC signals in digital circuits, it is more informative to study...
With the transistor scaling in the deca-nanometer range the impact of Random Telegraph Noise (RTN) o...
Abstract This paper investigates electrical effects due to reliability phenomena associated with the...
In this paper, the anomalously large random telegraph signal (RTS) noise amplitudes in tunneling fie...
Random telegraph noise (RTN) is one of the important dynamic variation sources in ultrascaled MOSFET...
The low frequency noise (LFN) mechanisms of TFETs with different source junction design are experime...
session: SOI Circuit DesignInternational audienceThis work investigates the impact of Random Telegra...
Abstract — One of the key challenges in scaling beyond 10-nm technology node is device-to-device var...
Abstract — We present an analysis of electrical noise in III–V heterojunction TFET (HTFET). Using nu...
Abstract — This paper analyzes the impacts of a single acceptor-type and donor-type interface trap i...
are promising candidates for low supply voltage applications with higher switching performance than ...
As one of the important sources of lowfrequency noise, random telegraph noise (RTN) in tunnel FET (T...
In this paper, multi-phonon transition model of RTN in FinFETs with statistical distribution is inte...
session A7L-E: Advanced CMOSInternational audienceThis work investigates the impact of Random Telegr...
In this paper, multi-phonon transition model of RTN in FinFETs with statistical distribution is inte...
Since devices actually operate under AC signals in digital circuits, it is more informative to study...
With the transistor scaling in the deca-nanometer range the impact of Random Telegraph Noise (RTN) o...
Abstract This paper investigates electrical effects due to reliability phenomena associated with the...
In this paper, the anomalously large random telegraph signal (RTS) noise amplitudes in tunneling fie...
Random telegraph noise (RTN) is one of the important dynamic variation sources in ultrascaled MOSFET...
The low frequency noise (LFN) mechanisms of TFETs with different source junction design are experime...
session: SOI Circuit DesignInternational audienceThis work investigates the impact of Random Telegra...
Abstract — One of the key challenges in scaling beyond 10-nm technology node is device-to-device var...