Plasma behaviour in HiPIMS versus conventional magnetron discharge

The High Power Impulse Magnetron Sputtering (HiPIMS) systems are designed to improve thin film deposition and they tend to replace the conventional magnetron sputtering methods. In spite of the important research efforts to qualify this novel plasma as actual deposition standard, much less has been made for plasma characterization, diagnostic and modelling. The HiPIMS plasma specificities – high inhomogeneous magnetic field, very high instantaneous power (up to MW during the pulse), fast time variation (µs) of plasma parameters, very low pressure (~0.2 Pa), etc. – makes it very interesting in terms of plasma formation, volume and surface kinetics, transport of sputtered particles in intermediary pressure regimen, electron diffusion across the magnetic field. These aspects are presented and discussed with respect to the conventional magnetron systems. 1