In this paper, (NH4)2S and Na2S were used as passivating agent for the sulphuration treatment of GaSb. Although the oxide layer can be removed by both (NH4)2S and Na2S, the etching rate of Na2S was faster than (NH4)2S, which caused the high RMS. After passivation treatment, PL instensity of GaSb increased, however, if the passivation time was too long, PL instensity would decrease. At low temperature PL spectrum, the emission located at 777meV and 795meV which can be associated with the transition from the conduction band to the native acceptor level VGaGaSb and the other peak corresponds to bound-edge-related transitions can be observed
Passivation of point and extended defects in GaSb has been observed as a result of hydrogenated amor...
In this study, we have investigated the photo-response of gallium antimonide (GaSb) by measuring the...
A clean and flat GaSb surface without native oxides has been attained by H2 plasma cleaning and subs...
Improvement in optical and surface morphology were observed after sulphur passivation of gallium ant...
In this work the influence of aqueous sulfur passivation on the surface of n-type (100) GaSb single ...
GaSb is one of the most suitable semiconductors for optoelectronic devices operating in the mid-infr...
Improvement in optical and electrical properties were observed after sulphur passivation of gallium ...
The suppression of leakage current via surface passivation plays a critical role for GaSb based opto...
Etching and sulfuring are equally important process during the surface sulfur passiva-tion of galliu...
Improvements in optical and electrical properties were observed after ruthenium passivation of galli...
III-V materials have emerged as potential candidates to replace silicon in metal-oxide-semiconductor...
A new class of insulating and passivating layers on gallium antimonide has been prepared by means of...
The effect of hydrogen plasma treatment on the optical and electrical properties of Gallium Antimoni...
The passivation of (100) GaSb surface was investigated by means of the long-chain octadecanethiol (O...
International audienceThe preparation of GaSb(100) surfaces by ultraviolet (UV) irradiation, prior t...
Passivation of point and extended defects in GaSb has been observed as a result of hydrogenated amor...
In this study, we have investigated the photo-response of gallium antimonide (GaSb) by measuring the...
A clean and flat GaSb surface without native oxides has been attained by H2 plasma cleaning and subs...
Improvement in optical and surface morphology were observed after sulphur passivation of gallium ant...
In this work the influence of aqueous sulfur passivation on the surface of n-type (100) GaSb single ...
GaSb is one of the most suitable semiconductors for optoelectronic devices operating in the mid-infr...
Improvement in optical and electrical properties were observed after sulphur passivation of gallium ...
The suppression of leakage current via surface passivation plays a critical role for GaSb based opto...
Etching and sulfuring are equally important process during the surface sulfur passiva-tion of galliu...
Improvements in optical and electrical properties were observed after ruthenium passivation of galli...
III-V materials have emerged as potential candidates to replace silicon in metal-oxide-semiconductor...
A new class of insulating and passivating layers on gallium antimonide has been prepared by means of...
The effect of hydrogen plasma treatment on the optical and electrical properties of Gallium Antimoni...
The passivation of (100) GaSb surface was investigated by means of the long-chain octadecanethiol (O...
International audienceThe preparation of GaSb(100) surfaces by ultraviolet (UV) irradiation, prior t...
Passivation of point and extended defects in GaSb has been observed as a result of hydrogenated amor...
In this study, we have investigated the photo-response of gallium antimonide (GaSb) by measuring the...
A clean and flat GaSb surface without native oxides has been attained by H2 plasma cleaning and subs...