Add to ORKGVacuum dehydration of negatively working photoresist eliminates trace contamination of conventional stripping methods. The semiconductor substrate is coated with photoresist, exposed, developed, cured, and etched, and then placed in a vacuum. Following dehydration, the resist film is removable with ordinary solvents
A liquid cleaning composition and method for removal of photoresist including an aliphatic alcohol. ...
Growth of silicon dioxide on a silicon carbide crystal ensures proper orientation of photoresist mas...
Fabrication method for cathode ray tubes uses low-cost siloxane resin formulations. The resins conta...
Standard developer solution is mixed with dipropyl carbonate. This reduces swelling in the photosens...
The usage of phase fluid based stripping agents to remove photoresists from silicon substrates was s...
Increasingly strict environmental regulations and the consequent phase out of many effective cleanin...
Cryogenic stripping of Teflon insulated wire leaves no residue and produces no physical damage. Afte...
Thermal control coating degradation under vacuum and ultraviolet radiation by chemical change of pho...
Process reduces secondary electron emission in coaxial connector and in waveguides in the atmosphere...
Rotary-knife stripper facilitates removal of X ray film from the daylight pack paper sleeve. The new...
Method which uses a disposable metal gasket that is removed when system is deactivated eliminates oi...
The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was st...
Double-wall vacuum chamber can be separated from the remainder of the system and pumped by ultra-cle...
Defects in photolithographic processing account for large yield losses in semiconductor device fabri...
An important module of the packaging based on flip-chip is the formation of solder or Cu bumps. Sold...
A liquid cleaning composition and method for removal of photoresist including an aliphatic alcohol. ...
Growth of silicon dioxide on a silicon carbide crystal ensures proper orientation of photoresist mas...
Fabrication method for cathode ray tubes uses low-cost siloxane resin formulations. The resins conta...
Standard developer solution is mixed with dipropyl carbonate. This reduces swelling in the photosens...
The usage of phase fluid based stripping agents to remove photoresists from silicon substrates was s...
Increasingly strict environmental regulations and the consequent phase out of many effective cleanin...
Cryogenic stripping of Teflon insulated wire leaves no residue and produces no physical damage. Afte...
Thermal control coating degradation under vacuum and ultraviolet radiation by chemical change of pho...
Process reduces secondary electron emission in coaxial connector and in waveguides in the atmosphere...
Rotary-knife stripper facilitates removal of X ray film from the daylight pack paper sleeve. The new...
Method which uses a disposable metal gasket that is removed when system is deactivated eliminates oi...
The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was st...
Double-wall vacuum chamber can be separated from the remainder of the system and pumped by ultra-cle...
Defects in photolithographic processing account for large yield losses in semiconductor device fabri...
An important module of the packaging based on flip-chip is the formation of solder or Cu bumps. Sold...
A liquid cleaning composition and method for removal of photoresist including an aliphatic alcohol. ...
Growth of silicon dioxide on a silicon carbide crystal ensures proper orientation of photoresist mas...
Fabrication method for cathode ray tubes uses low-cost siloxane resin formulations. The resins conta...