2パナソニッ ク (株) システムソリューションズ社

In semiconductor and LCD manufacturing processes, lm thickness and surface proles of lm-covered objects need to be measured simultaneously. We extend phase-shifting interferometry and propose an algorithm named the SOR (Separation of Object and Reference beams) method that enables such simultaneous measurement. The SOR method can be applied not only to thick lms but also to thin lms, which is an advantage over existing methods. We apply th