In the semiconductor and LCD manufacturing industry, there is a strong demand for measuring film thickness and surface profiles of film-covered objects. In this paper, we propose a single-shot algorithm for simultaneous measurement of film thickness and surface profiles. Unlike existing multiple-shot meth-ods, our method requires only one image for measurement and thus it is fast and highly robust against vibration
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A procedure has been developed for the accurate measurement of film and substrate optical parameter...
Recent years have seen a tremendous increase in thin film activity. The electronics industry, in par...
In semiconductor and LCD manufacturing processes, film thickness and surface profile of film-covered...
During the manufacturing of printed electronic circuits, different layers of coatings are applied su...
An astigmatic optical profilometer is a precision instrument with advantages such as high resolution...
In semiconductor and LCD manufacturing processes, lm thickness and surface proles of lm-covered obj...
Semiconductor processing in manufacturing must be fast and highly accurate in the measuring of the s...
<p>Film thickness profile after 3600 seconds of contact, at both (a) 25°C and (b) 59°C.</p
International audienceA double-side optical profilometer based on white-light interferometry was dev...
Thickness characterization of thin films is of primary importance in a variety of nanotechnology app...
The need to measure the thickness of thin liquid films is evident from the number of methods that h...
针对自由曲面透明体厚度测量,提出一种基于结构光机理的3D 视觉测量方法和系统结构,介绍了该方法的基本原理和测量系统实现技术,并给出了部分实验,证实了该方法的有效性
The requirements for high precision metrology devices have increased rapidly in recent years. Furthe...
When one will measure the precision profiles of super smooth surfaces using an optical interferomete...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A procedure has been developed for the accurate measurement of film and substrate optical parameter...
Recent years have seen a tremendous increase in thin film activity. The electronics industry, in par...
In semiconductor and LCD manufacturing processes, film thickness and surface profile of film-covered...
During the manufacturing of printed electronic circuits, different layers of coatings are applied su...
An astigmatic optical profilometer is a precision instrument with advantages such as high resolution...
In semiconductor and LCD manufacturing processes, lm thickness and surface proles of lm-covered obj...
Semiconductor processing in manufacturing must be fast and highly accurate in the measuring of the s...
<p>Film thickness profile after 3600 seconds of contact, at both (a) 25°C and (b) 59°C.</p
International audienceA double-side optical profilometer based on white-light interferometry was dev...
Thickness characterization of thin films is of primary importance in a variety of nanotechnology app...
The need to measure the thickness of thin liquid films is evident from the number of methods that h...
针对自由曲面透明体厚度测量,提出一种基于结构光机理的3D 视觉测量方法和系统结构,介绍了该方法的基本原理和测量系统实现技术,并给出了部分实验,证实了该方法的有效性
The requirements for high precision metrology devices have increased rapidly in recent years. Furthe...
When one will measure the precision profiles of super smooth surfaces using an optical interferomete...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A procedure has been developed for the accurate measurement of film and substrate optical parameter...
Recent years have seen a tremendous increase in thin film activity. The electronics industry, in par...
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