CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS

Abstract. Thin films of CrxOy were deposited on glass and stainless steel substrates at low temperature (< 500 MC). The films were prepared using a midfrequency (40 kHz) AC sputtering technique in an Isoflux ICM-10 sputter deposition system consisting of two hollow cylindrical targets of Cr in an argon-oxygen plasma. The effects of RF magnetron power, substrate biasing 3]6F:7B[3E?3PEAJK97]FA3D9A]D3F;AA]F:78;[?EP5DKEF3[AD;7]F3F;A]3]6:3D6]7EEI7D7 investigated. The stoichiometric O/Cr ratio was determined from energy dispersive X-ray spec-troscopy analyses. These studies gave a ratio of 1.5 when the argon to oxygen ratio was 1. When the steel substrates were biased at (-25 V) DC, the hardness nanoindentation test of the depos-ited films gave values up to 30 GPa. These values indicate growth of decidedly crystalline -Cr2O3 films on these substrates. 1