AN IMPLANTATION FACILITY FOR SURFACE MODIFICATION OF METALS

A 280 KeV ion implantation facility has been developed for research of surface modification of metals by ion beams and their applications. The machine consists of an ion implanter and a surface treatment equipment by ion beam. The energy of 60-280 KeV and typical N+ and Ar+ ion beam current of 3 mA have been obtained for the implanter, respectively. The sputtering ion source mounted on the surface treatment equipment has produced N+, Ar+ and Xe+ beam current of more than 10 mA at extraction voltage of 2 KeV. The machine has three functions of direction implantation, ion beam sputtering deposition and dynamic ion bean mixing when two parts were combined. The main component and feature of the machine are described in this paper. The results of the tested samples have been given. 1