Damage behaviour and thresholds for single 248 nmr14 ns excimer laser pulses have been investigated for single .crystals of CaF and BaF with 111 surface orientation. The probe beam deflection technique was applied as a sensitive2 2 tool for detecting the onset of single-shot damage. Below the plasma threshold, we observed one- and two-photon absorption for CaF and BaF, respectively. When testing the influence of different polishing techniques, we found the lowest2 2 thresholds for conventional hard-polish. Advanced methods as ductile machining or chemical polishing lead to a distinct increase in damage threshold up to and even better than what is observed for cleaved surfaces. SEM investigations of irradiated areas show that damage preferab...
The authors have reported extensive measurements of damage thresholds for fused silica and several f...
Scanning electron microscope observations off damaged coatings from 355nm to 193nm are reported. Fro...
Calcium fluoride (CaF2) is one of the key lens materials in deep-ultraviolet microlithography becaus...
We investigated the surface damage of CaF2 induced by irradiation with 248 nm/14 ns laser pulses. Ex...
The thesis describes the establishment of a laser damage facility in the ultra violet. The laser is ...
As advances continue to be made in laser technology there is an increasing demand for materials that...
Magnesium fluoride is a commonly used material in laser systems due to its optical transmission for ...
Comparative tests of bulk laser-induced damage of some experimental crystals having prospects for la...
The fracture damage of bulk (1 1 I)-CaFz crystals induced by pulsed irradiation in single shot mode ...
The laser damage resistances of four crystals (CaF2, MgF2, Al2O3, and SiO2) and fused silica (JGS1) ...
The exterior sides of calcium fluoride (CaF2) outcoupling mirrors are damaged by ArF laser light irr...
The aim of our investigation was to explain the causes and kinds of the destruction of optical coati...
Laser damage performance of large aperture optical components has been study under fourth harmonic o...
We report the systematic experimental study of the surface modifications resulting by interactions o...
Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substr...
The authors have reported extensive measurements of damage thresholds for fused silica and several f...
Scanning electron microscope observations off damaged coatings from 355nm to 193nm are reported. Fro...
Calcium fluoride (CaF2) is one of the key lens materials in deep-ultraviolet microlithography becaus...
We investigated the surface damage of CaF2 induced by irradiation with 248 nm/14 ns laser pulses. Ex...
The thesis describes the establishment of a laser damage facility in the ultra violet. The laser is ...
As advances continue to be made in laser technology there is an increasing demand for materials that...
Magnesium fluoride is a commonly used material in laser systems due to its optical transmission for ...
Comparative tests of bulk laser-induced damage of some experimental crystals having prospects for la...
The fracture damage of bulk (1 1 I)-CaFz crystals induced by pulsed irradiation in single shot mode ...
The laser damage resistances of four crystals (CaF2, MgF2, Al2O3, and SiO2) and fused silica (JGS1) ...
The exterior sides of calcium fluoride (CaF2) outcoupling mirrors are damaged by ArF laser light irr...
The aim of our investigation was to explain the causes and kinds of the destruction of optical coati...
Laser damage performance of large aperture optical components has been study under fourth harmonic o...
We report the systematic experimental study of the surface modifications resulting by interactions o...
Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substr...
The authors have reported extensive measurements of damage thresholds for fused silica and several f...
Scanning electron microscope observations off damaged coatings from 355nm to 193nm are reported. Fro...
Calcium fluoride (CaF2) is one of the key lens materials in deep-ultraviolet microlithography becaus...