We conduct a thorough investigation of the tunneling dynamics of oxide traps in a-SiO2, in particular of the E′δ center, the E γ center, their hydrogenated counterparts, and the H atom. Based on these findings their behavior in the context of tunneling can be deduced. It is found that an E′γ center can exchange electrons with the Si bulk. The E′δ center shows two distinct behaviors induced by a spread in its tunneling levels. The H atom is not affected by the presence of an interface, whereas a H bridge may occur in every charge state.
172 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1988.Silicon dioxide has had a dom...
In this paper, we investigate the tunneling properties of ZrO2 and HfO2 high-kappa oxides, by applyi...
A completely first-principles procedure for the creation of experimentally validated amorphous silic...
Using classical and ab initio calculations we demonstrate that extra electrons can be trapped in pur...
We used ab initio calculations to investigate the hole trapping reactions at a neutral defect center...
Using classical and ab initio calculations we demonstrate that extra electrons can be trapped in pur...
Electron trapping near the Si/SiO{sub 2} interface plays a crucial role in mitigating the response o...
Slater's 3-dimensional localized perturbation theory for bound electronic states at bulk donor ...
An experimental investigation on oxide positive charge buildup in sub 3-nm silicon dioxide (SiO<sub>...
Using ab initio calculations we demonstrate that extra electrons in pure amorphous SiO2 can be trapp...
Using computational modelling we investigate whether Si-H Bonds can serve as precursors for neutral ...
The complexity of charge trapping in semiconductor devices, such as high-κ MOSFETs, is increasing as...
Using computational modelling we investigate whether Si–H Bonds can serve as precursors for neutral ...
Charge trapping characteristics of ultrathin silicon dioxide NOD films during constant voltage stres...
We report the first ab initio quantum mechanical investigation of the structure of the E{sub {delta}...
172 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1988.Silicon dioxide has had a dom...
In this paper, we investigate the tunneling properties of ZrO2 and HfO2 high-kappa oxides, by applyi...
A completely first-principles procedure for the creation of experimentally validated amorphous silic...
Using classical and ab initio calculations we demonstrate that extra electrons can be trapped in pur...
We used ab initio calculations to investigate the hole trapping reactions at a neutral defect center...
Using classical and ab initio calculations we demonstrate that extra electrons can be trapped in pur...
Electron trapping near the Si/SiO{sub 2} interface plays a crucial role in mitigating the response o...
Slater's 3-dimensional localized perturbation theory for bound electronic states at bulk donor ...
An experimental investigation on oxide positive charge buildup in sub 3-nm silicon dioxide (SiO<sub>...
Using ab initio calculations we demonstrate that extra electrons in pure amorphous SiO2 can be trapp...
Using computational modelling we investigate whether Si-H Bonds can serve as precursors for neutral ...
The complexity of charge trapping in semiconductor devices, such as high-κ MOSFETs, is increasing as...
Using computational modelling we investigate whether Si–H Bonds can serve as precursors for neutral ...
Charge trapping characteristics of ultrathin silicon dioxide NOD films during constant voltage stres...
We report the first ab initio quantum mechanical investigation of the structure of the E{sub {delta}...
172 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1988.Silicon dioxide has had a dom...
In this paper, we investigate the tunneling properties of ZrO2 and HfO2 high-kappa oxides, by applyi...
A completely first-principles procedure for the creation of experimentally validated amorphous silic...