In the semiconductor device, the thick film SOI structure can separate various devices by dielectric isolation and can improve the noise immunity and thermo-tolerance demanded as automotive electronics remarkably. Moreover, it is suitable for integration of the high voltage devices in a high density. In addition, this structure can simplify the wafer processing in the MEMS field and can especially realize a unique sensor.1) On the other hand, the silicon wafer direct bonding technique enables a new structure such as the buried electrode etc. to be formed in the substrate, and can give the semiconductor device a new, additional function. In this paper, some semiconductor devices that we developed by using the feature of SOI structure mention...
The wafer bonding technology offers a unique opportunity to combine different materials. This has be...
In this project, the realization of a trenched SOI substrate is carried out, and the characterizatio...
In this project, the realization of a trenched SOI substrate is carried out, and the characterizatio...
We have studied direct bonding and thinning of pre-etched silicon wafers. Silicon-on-insulator (SOI)...
We have studied direct bonding and thinning of pre-etched silicon wafers. Silicon-on-insulator (SOI)...
This paper reports a process for the formation of very high quality single-crystal silicon films on ...
Silicon-on-insulator devices have problems with both performance and cost. We developed three advanc...
An overview is given on the use of wafer bonding for formation of Silicon-On-Insulator (SOI) materia...
An overview is given on the use of wafer bonding for formation of Silicon-On-Insulator (SOI) materia...
We have developed a novel (silicon-on-insulator (SOI), microelectromechanical systems (MEMS)) SOI-ME...
Direct wafer bonding is a method for fabricating advanced substrates for microelectromechanical syst...
Direct wafer bonding is a method for fabricating advanced substrates for microelectromechanical syst...
A microelectric process technology has been developed to allow the fabrication of high-quality, unif...
This paper describes work to fabricate resonators on silicon-on-insulator (SOI) wafers with sub-micr...
This paper describes work to fabricate resonators on silicon-on-insulator (SOI) wafers with sub-micr...
The wafer bonding technology offers a unique opportunity to combine different materials. This has be...
In this project, the realization of a trenched SOI substrate is carried out, and the characterizatio...
In this project, the realization of a trenched SOI substrate is carried out, and the characterizatio...
We have studied direct bonding and thinning of pre-etched silicon wafers. Silicon-on-insulator (SOI)...
We have studied direct bonding and thinning of pre-etched silicon wafers. Silicon-on-insulator (SOI)...
This paper reports a process for the formation of very high quality single-crystal silicon films on ...
Silicon-on-insulator devices have problems with both performance and cost. We developed three advanc...
An overview is given on the use of wafer bonding for formation of Silicon-On-Insulator (SOI) materia...
An overview is given on the use of wafer bonding for formation of Silicon-On-Insulator (SOI) materia...
We have developed a novel (silicon-on-insulator (SOI), microelectromechanical systems (MEMS)) SOI-ME...
Direct wafer bonding is a method for fabricating advanced substrates for microelectromechanical syst...
Direct wafer bonding is a method for fabricating advanced substrates for microelectromechanical syst...
A microelectric process technology has been developed to allow the fabrication of high-quality, unif...
This paper describes work to fabricate resonators on silicon-on-insulator (SOI) wafers with sub-micr...
This paper describes work to fabricate resonators on silicon-on-insulator (SOI) wafers with sub-micr...
The wafer bonding technology offers a unique opportunity to combine different materials. This has be...
In this project, the realization of a trenched SOI substrate is carried out, and the characterizatio...
In this project, the realization of a trenched SOI substrate is carried out, and the characterizatio...