Table 1. The Thickness Data Thickness Measurements of Ultra-thin Oxides Using AFM

Abstracts – In this paper, we propose a new method that can measure the thickness of thin films regardless of the kinds of samples using AFM (Atomic Force Microscopy). The characteristics of AFM lead to the ability to measure the thickness of thin films regardless of the kinds and the conductivity of the samples. As an example, SiO2 thickness grown on Si that becomes more significant as the thickness becomes small was determined. We compared the thickness value determined using this method with TEM (Transmission Electron Microscopy) data. We obtained the reasonable thickness data between 20 and 40Åcomparing with TEM data. I