Recent progress in the fabrication technology of silicon nanostructures has made possible observations of novel electrical and optical properties of silicon quantum dots, such as single electron tunneling, ballistic transport, visible photoluminescence and electron emission. Nanocrystalline silicon particles with size less than 10 nm have been prepared by VHF plasma decomposition of silane gas. Pulsed gas plasma processing, in which the nucleation and the growth period are controlled precisely, is turned out to be effective for the preparation of monodispersed nanocrystalline silicon particles [1]. Electrical properties of nanocrystalline silicon particles have been investigated by employing nanoscale electrodes
An innovative and effective approach based on low-pressure, low-frequency, thermally nonequilibrium,...
Thin film stacks, made of Si-rich SiO alternated with SiO(2) layers, have been deposited by reactive...
Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Depositi...
Nanocrystalline silicon is a promising material for future ultralarge scale integrated circuits and ...
A new method for the fabrication of nanocrystalline silicon (nc-Si) in SiH4 plasma with very-high-fr...
Silicon nanoparticle, typically when in the quantum dot region of less than 10nm, demonstrated uniqu...
ABSTRACT Using very-high-frequency (VHF) plasma decomposition of SiH4 and pulsed gas technique...
One of the most important fields in semiconductor physics is study the nanostructure of materials wi...
Silicon as a mono-crystalline bulk semiconductor is today the predominant material in many integrate...
We demonstrate a method for synthesizing free standing silicon nanocrystals in an argon/silane gas m...
Silicon is the backbone of semiconductor industry. It is the building block of most of the modern s...
Semiconductor nanocrystals (NCs) are relevant structures for the realisation of low-cost production ...
This brief review focuses on the production and processing of nanocrystals and nanostructures in sil...
In this thesis, the structural, optical and electrical properties of crystalline silicon quantum dot...
The growth mechanism of silicon nanocrystals (Si NCs) synthesized at a high rate by means of expandi...
An innovative and effective approach based on low-pressure, low-frequency, thermally nonequilibrium,...
Thin film stacks, made of Si-rich SiO alternated with SiO(2) layers, have been deposited by reactive...
Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Depositi...
Nanocrystalline silicon is a promising material for future ultralarge scale integrated circuits and ...
A new method for the fabrication of nanocrystalline silicon (nc-Si) in SiH4 plasma with very-high-fr...
Silicon nanoparticle, typically when in the quantum dot region of less than 10nm, demonstrated uniqu...
ABSTRACT Using very-high-frequency (VHF) plasma decomposition of SiH4 and pulsed gas technique...
One of the most important fields in semiconductor physics is study the nanostructure of materials wi...
Silicon as a mono-crystalline bulk semiconductor is today the predominant material in many integrate...
We demonstrate a method for synthesizing free standing silicon nanocrystals in an argon/silane gas m...
Silicon is the backbone of semiconductor industry. It is the building block of most of the modern s...
Semiconductor nanocrystals (NCs) are relevant structures for the realisation of low-cost production ...
This brief review focuses on the production and processing of nanocrystals and nanostructures in sil...
In this thesis, the structural, optical and electrical properties of crystalline silicon quantum dot...
The growth mechanism of silicon nanocrystals (Si NCs) synthesized at a high rate by means of expandi...
An innovative and effective approach based on low-pressure, low-frequency, thermally nonequilibrium,...
Thin film stacks, made of Si-rich SiO alternated with SiO(2) layers, have been deposited by reactive...
Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Depositi...