A cold cathode ion source is a differentially pumped device with one end of the plasma chamber open to the vacuum environment of the coating system. Therefore, the operational parameters of the ion source and the quality of the films made using the ion source are affected by the parameters controlling the vacuum level. These include the pumping speed of the chamber, any leaks that may be present and the controlled flow of any gases into the chamber. The pumping speed of the chambers is the major factor not directly controllable that affects the quality of the films that can be made using the ion source. In this study we will present data on the operational parameters of a cold cathode ion source at different pumping speeds and the subsequen...
Silicon dioxide has many desirable properties as a coating material for the visible and near JR spec...
A new atmospheric pressure plasma electrolytic deposition process has been developed for the product...
Thin films deposited in high vacuum by thermal evaporation, electron beam evaporation, and ion assis...
In the present work, the energy and flux of impinging ions are evaluated in the context of ion-assis...
Concerning optical and structural properties, for different oxide and fluoride materials IAD-coating...
A hollow cathode plasma source has been operated automatically, demonstrating independent control of...
A comparative study of different ion and plasma assisted physical vapor deposition processes at low ...
Nearly all the deficiencies of conventional vacuum evaporated coatings trace to a single physical pr...
Energetic process development in the production of optical coatings has progressed significantly ove...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
Funding Information: This work was part of the research program HTSM with Project No. 15352, which i...
Title: The investigation of low pressure HCPJ system for TiO2 film deposition Author: Mgr. Roman Per...
A new atmospheric pressure plasma electrolytic deposition process has been developed for the product...
Typical plasma sources, as used in optical coating, bombard the surfaces of the substrates with elec...
Silicon dioxide has many desirable properties as a coating material for the visible and near JR spec...
A new atmospheric pressure plasma electrolytic deposition process has been developed for the product...
Thin films deposited in high vacuum by thermal evaporation, electron beam evaporation, and ion assis...
In the present work, the energy and flux of impinging ions are evaluated in the context of ion-assis...
Concerning optical and structural properties, for different oxide and fluoride materials IAD-coating...
A hollow cathode plasma source has been operated automatically, demonstrating independent control of...
A comparative study of different ion and plasma assisted physical vapor deposition processes at low ...
Nearly all the deficiencies of conventional vacuum evaporated coatings trace to a single physical pr...
Energetic process development in the production of optical coatings has progressed significantly ove...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
Funding Information: This work was part of the research program HTSM with Project No. 15352, which i...
Title: The investigation of low pressure HCPJ system for TiO2 film deposition Author: Mgr. Roman Per...
A new atmospheric pressure plasma electrolytic deposition process has been developed for the product...
Typical plasma sources, as used in optical coating, bombard the surfaces of the substrates with elec...
Silicon dioxide has many desirable properties as a coating material for the visible and near JR spec...
A new atmospheric pressure plasma electrolytic deposition process has been developed for the product...
Thin films deposited in high vacuum by thermal evaporation, electron beam evaporation, and ion assis...