Add to ORKGReactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEMfEPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria
International audienceMonolith-type titanium nitride/silicon nitride nanocomposites, denoted as TiN/...
The annealing processes of Ti/SiO2/Si system at different temperatures in nitrogen with a trace of o...
Understanding the phase formation mechanisms in self-propagating high-temperature synthesis from the...
Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C ...
Abstract For the ,system Ti-Si-C ations of these new materials in e.g. cutting tools, aerospace en...
Diffusion and reactions were studied between TiC and SiC or Si3N4 at high temps. with formation of b...
Chemical interaction in the TiCSi3N4 system was investigated. Thermodynamic calculations and kinetic...
The physical properties including the mechanical, optical and electrical properties of Ti nitrides a...
(in lih). D ~ i c 1 4 and D m were kept constant at 0.183 and 30 (in llh) respectively. According to...
Solid diffusion couple experiments are conducted to analyse the growth mechanism of the phases and t...
[[abstract]]A comparative study of rapid thermal nitridation (RTN) of Ti, reactively-ion-sputtered (...
It is known that thermal annealing of Ti and amorphous (alpha) Si first results in an amorphous sili...
International audienceMonolith-type titanium nitride/silicon nitride nanocomposites, denoted as TiN/...
The annealing processes of Ti/SiO2/Si system at different temperatures in nitrogen with a trace of o...
Understanding the phase formation mechanisms in self-propagating high-temperature synthesis from the...
Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C ...
Abstract For the ,system Ti-Si-C ations of these new materials in e.g. cutting tools, aerospace en...
Diffusion and reactions were studied between TiC and SiC or Si3N4 at high temps. with formation of b...
Chemical interaction in the TiCSi3N4 system was investigated. Thermodynamic calculations and kinetic...
The physical properties including the mechanical, optical and electrical properties of Ti nitrides a...
(in lih). D ~ i c 1 4 and D m were kept constant at 0.183 and 30 (in llh) respectively. According to...
Solid diffusion couple experiments are conducted to analyse the growth mechanism of the phases and t...
[[abstract]]A comparative study of rapid thermal nitridation (RTN) of Ti, reactively-ion-sputtered (...
It is known that thermal annealing of Ti and amorphous (alpha) Si first results in an amorphous sili...
International audienceMonolith-type titanium nitride/silicon nitride nanocomposites, denoted as TiN/...
The annealing processes of Ti/SiO2/Si system at different temperatures in nitrogen with a trace of o...
Understanding the phase formation mechanisms in self-propagating high-temperature synthesis from the...