A technique based on coherent control for the optical manipulation of deposition patterns in nanofabrication with neutral atomic beams is described. The theory, optical nanolithography with bichromatic fields, is then applied to the deposition of rubidium Rydberg atoms on surfaces. Controllable nonperiodic patterns and deposition lines are shown to be possible due to interference contributions to the induced polarizability. I
Contains fulltext : 18994_lasemaofa.pdf (publisher's version ) (Open Access)Fundam...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum...
We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave...
State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Alum...
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matte...
The method of neutral atom lithography allows to transfer a 2D intensity modulation of an atomic bea...
Fundamental interaction processes between atoms and photons are exploited to control external degree...
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant l...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
Atom lithography is a technique to structure layers of atoms during deposition, using interactions o...
Contains fulltext : 57910.pdf (publisher's version ) (Open Access)We deposit a las...
Crystalline structures of highly excited Rydberg atoms can be a model for dilute metallic solids wit...
Abstract. This paper reviews recent experimental results on temporal coherent control of electromc e...
Contains fulltext : 18994_lasemaofa.pdf (publisher's version ) (Open Access)Fundam...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum...
We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave...
State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Alum...
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matte...
The method of neutral atom lithography allows to transfer a 2D intensity modulation of an atomic bea...
Fundamental interaction processes between atoms and photons are exploited to control external degree...
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant l...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
Atom lithography is a technique to structure layers of atoms during deposition, using interactions o...
Contains fulltext : 57910.pdf (publisher's version ) (Open Access)We deposit a las...
Crystalline structures of highly excited Rydberg atoms can be a model for dilute metallic solids wit...
Abstract. This paper reviews recent experimental results on temporal coherent control of electromc e...
Contains fulltext : 18994_lasemaofa.pdf (publisher's version ) (Open Access)Fundam...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum...