Journal of Physics and Chemistry of S id

a, ngk sity ed Titanium oxide (TiO2) and zirconium oxide (ZrO2) thin films have been deposited on modified Si(1 0 0) substrates selectively by metal-i Oxide materials have a wealth of interesting physical dielectric constant. Up to now, TiO2 has been extensively studied for its interesting electric, magnetic, catalytic, thin film are possible. Also, zirconium oxide (ZrO2) bility of epitaxial growth and selective deposition and the application to large-area deposition, etc. Also this method ARTICLE IN PRESSis low cost and is easy to control the deposition/growth parameters. Thus, the MOCVD method is well known as the one of the most powerful techniques and is suitable fo