Scaling of HBTs for high circuit bandwidth and high current gain ( τf) and power gain ( maxf) cutoff frequencies is summarized. Key bandwidth limits include scaling of the collector-base junction, the emitter Ohmic contact resistivity, and greatly increased current density. Substrate transfer processes allow submicron collector scaling, and have produced HBTs with 20 dB power gain at 100 GHz. 295 GHz τf has been obtained. Key to continued progress is improvement of emitter contacts and reliable operation at ~ 610 A / 2cm current density
The objective is to develop a baseline fabrication technology for GaAs-based Heterojunction Bipolar ...
To meet the requirement for today’s 2.4GHz high power circuit applications, we designed and processe...
Compared to SiGe, InP HBTs offer superior electron transport properties but inferior scaling and par...
Transistor bandwidths are approaching terahertz frequencies. Paramount to high speed transistor oper...
Abstract|With appropriate device structures, com-bined lithographic and epitaxial scaling of HBTs, R...
This thesis deals with the development of high speed InPmesa HBT\u92s with power gain cut\u97off fre...
Abstract|With appropriate device structures, com-bined lithographic and epitaxial scaling of HBTs, R...
InP-based single heterojunction bipolar transistors (SHBTs) for high-speed circuit applications were...
With appropriate device structures, bined lithographi and epitaxial scaling of HBTs,RTDs and S hottk...
Heterojunction Bipolar Transistor (HBT) technology has emerged as one of the most promising technolo...
We present ongoing work towards the development of submillimeter wave transistors with goals of real...
electron transport but inferior scaling and parasitic reduction. Figures of merit for mixed-signal I...
87 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.Using the optimized growth con...
Abstract—Compared to SiGe, InP HBTs offer superior electron transport properties but inferior scalin...
The current status of Heterojunction Bipolar and High-Electron Mobility Transistor technology is rev...
The objective is to develop a baseline fabrication technology for GaAs-based Heterojunction Bipolar ...
To meet the requirement for today’s 2.4GHz high power circuit applications, we designed and processe...
Compared to SiGe, InP HBTs offer superior electron transport properties but inferior scaling and par...
Transistor bandwidths are approaching terahertz frequencies. Paramount to high speed transistor oper...
Abstract|With appropriate device structures, com-bined lithographic and epitaxial scaling of HBTs, R...
This thesis deals with the development of high speed InPmesa HBT\u92s with power gain cut\u97off fre...
Abstract|With appropriate device structures, com-bined lithographic and epitaxial scaling of HBTs, R...
InP-based single heterojunction bipolar transistors (SHBTs) for high-speed circuit applications were...
With appropriate device structures, bined lithographi and epitaxial scaling of HBTs,RTDs and S hottk...
Heterojunction Bipolar Transistor (HBT) technology has emerged as one of the most promising technolo...
We present ongoing work towards the development of submillimeter wave transistors with goals of real...
electron transport but inferior scaling and parasitic reduction. Figures of merit for mixed-signal I...
87 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.Using the optimized growth con...
Abstract—Compared to SiGe, InP HBTs offer superior electron transport properties but inferior scalin...
The current status of Heterojunction Bipolar and High-Electron Mobility Transistor technology is rev...
The objective is to develop a baseline fabrication technology for GaAs-based Heterojunction Bipolar ...
To meet the requirement for today’s 2.4GHz high power circuit applications, we designed and processe...
Compared to SiGe, InP HBTs offer superior electron transport properties but inferior scaling and par...