Microstructural Characterization and Hardening Behavior of Reactive Magnetron Sputtered TiN/Si3N4 Multilayer Thin Films

Cover figure: Interior view of the deposition chamber with both targets ignited. The titanium target is located in front whereas the silicon target can be seen in the background. For details see section 3.1. Title page figure: Superlattice reflections observed with TEM. These originate from the highly ordered structure within a multilayer thin film. This specific sample has a wavelength of 7.3 nm (4.5 nm TiN/2.8 nm Si3N4)