We have developed a three-dimensional particle based simulator with a coupled molecular dynamics routine that avoids the "double-counting " of the long-range portion of the Coulomb force. As opposed to drift-diffusion based simulators, the Monte Carlo simulator can accurately model high field transport in semiconductor devices, while enabling the real-space treatment of the interactions, in-cluding multi-ion and particle contributions, through the coupled molecular dynamics scheme. The inclusion of the electron-electron and electron-ion interactions was shown to play an important role in device simulations. The drain current for MOSFET devices was significantly decreased when the Coulomb forces were added. Using this simula-tor, r...
The International Technology Roadmap for Semiconductors (ITRS) specifies that MOSFET logic devices a...
The International Technology Roadmap for Semiconductors (ITRS) specifies that MOSFET logic devices a...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...
We present a 3D Ensemble Monte Carlo particle-based simulator with a novel realspace treatment of th...
97 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000.The combined P3M-EMC method is...
Electron-electron and electron-impurity interactions play an important role in ultra-small MOSFETs. ...
Numerical simulations have been performed to study the single-charge-induced ON current fluctuations...
Monte Carlo simulations coupled self-consistently with the three-dimensional Poisson equation are ca...
We present a hierarchical approach to the 'atomistic' simulation of aggressively scaled sub-0.1-μm ...
A comprehensive simulation study, of random-dopant-induced drain current variability is presented fo...
As the feature sizes in VLSI technology shrink to less than 100 nm the effects due to the quantisati...
As the feature sizes in VLSI technology shrink to less than 100 nm the effects due to the quantisati...
We present a hierarchical approach to the 'atomistic' simulation of aggressively scaled sub-0.1-μm ...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...
The International Technology Roadmap for Semiconductors (ITRS) specifies that MOSFET logic devices a...
The International Technology Roadmap for Semiconductors (ITRS) specifies that MOSFET logic devices a...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...
We present a 3D Ensemble Monte Carlo particle-based simulator with a novel realspace treatment of th...
97 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000.The combined P3M-EMC method is...
Electron-electron and electron-impurity interactions play an important role in ultra-small MOSFETs. ...
Numerical simulations have been performed to study the single-charge-induced ON current fluctuations...
Monte Carlo simulations coupled self-consistently with the three-dimensional Poisson equation are ca...
We present a hierarchical approach to the 'atomistic' simulation of aggressively scaled sub-0.1-μm ...
A comprehensive simulation study, of random-dopant-induced drain current variability is presented fo...
As the feature sizes in VLSI technology shrink to less than 100 nm the effects due to the quantisati...
As the feature sizes in VLSI technology shrink to less than 100 nm the effects due to the quantisati...
We present a hierarchical approach to the 'atomistic' simulation of aggressively scaled sub-0.1-μm ...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...
The International Technology Roadmap for Semiconductors (ITRS) specifies that MOSFET logic devices a...
The International Technology Roadmap for Semiconductors (ITRS) specifies that MOSFET logic devices a...
This paper presents the results of a comparison among five Monte Carlo device simulators for nano-sc...