HIGH PRECISION INSTRUMENT FOR MICRO SURFACE PROFILE MEASUREMENT BASED ON OPTICAL INVERSE SCATTERING PHASE METHOD

Abstract − With the advance of microtechnology, in-process or in situ measurement techniques for measuring surface profiles of engineered micro parts have been in-creasingly required. We have proposed an optical measure-ment technique, the optical inverse scattering phase method, which can be applied to the in-process measurement of micro-surface profile with the accuracy in the nanometer order. An instrument has been designed and developed on the basis of the proposed principles, and verified by meas-uring an ultra precision grid plate having rectangular pock-ets 44nm deep at intervals of 10µm. The measured surface profile gave good agreement with the nominal dimensions of the specimen as well as the one obtained by AFM