Precise wafer-to-wafer alignment accuracy is crucial to interconnecting circuits on different wafers in three dimensional integrated circuits. We discuss the use of fabricated structures on wafer surfaces to mechanically achieve higher alignment accuracy than can be achieved with our existing (baseline) alignment protocol. The keyed alignment structures rely on structures with tapered side-walls that can slide into each after two wafers are “pre-aligned” using our baseline alignment protocol. Results indicate that alignment accuracy is about a quarter micron, well below the one micron alignment accuracy obtained in our baseline alignment procedure using commercial state-of-the-art wafer alignment equipment. In addition to improving alignmen...
Paradigm shift to 3-D chip stacking in electronic packaging has induced a lot of integration challen...
This paper investigates a moiré-based mark for high-precision wafer bonding alignment. During alignm...
We demonstrate that multilevel nanoimprint lithography (NIL) with submicron alignment over an entire...
High precision bonding alignment has been a key issue hindering the realization of many advanced sem...
Wafer bonding has been identified as a promising technique to enable fabrication of many advanced se...
Wafer bonding has been identified as a promising technique to enable fabrication of many advanced se...
Wafer bonding has been identified as a promising technique to enable fabrication of many advanced sem...
Exploiting mechanical principles of kinematic and elastic averaging, a novel passive approach has be...
peer reviewedExploiting mechanical principles of kinematic and elastic averaging, a novel passive ap...
High-precision aligned wafer bonding is essential to heterogeneous integration, with the device dime...
Several macro-scale bench level experiments were carried out to evaluate the alignment repeatability...
\u3cp\u3eAccurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the...
Technology advances such as 3-D Integration are expanding the potential applications of products int...
Accurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the wafer su...
Accurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the wafer su...
Paradigm shift to 3-D chip stacking in electronic packaging has induced a lot of integration challen...
This paper investigates a moiré-based mark for high-precision wafer bonding alignment. During alignm...
We demonstrate that multilevel nanoimprint lithography (NIL) with submicron alignment over an entire...
High precision bonding alignment has been a key issue hindering the realization of many advanced sem...
Wafer bonding has been identified as a promising technique to enable fabrication of many advanced se...
Wafer bonding has been identified as a promising technique to enable fabrication of many advanced se...
Wafer bonding has been identified as a promising technique to enable fabrication of many advanced sem...
Exploiting mechanical principles of kinematic and elastic averaging, a novel passive approach has be...
peer reviewedExploiting mechanical principles of kinematic and elastic averaging, a novel passive ap...
High-precision aligned wafer bonding is essential to heterogeneous integration, with the device dime...
Several macro-scale bench level experiments were carried out to evaluate the alignment repeatability...
\u3cp\u3eAccurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the...
Technology advances such as 3-D Integration are expanding the potential applications of products int...
Accurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the wafer su...
Accurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the wafer su...
Paradigm shift to 3-D chip stacking in electronic packaging has induced a lot of integration challen...
This paper investigates a moiré-based mark for high-precision wafer bonding alignment. During alignm...
We demonstrate that multilevel nanoimprint lithography (NIL) with submicron alignment over an entire...