Breakdown of gate oxides from heavy ions is investigated. Soft breakdown was observed for 45 8, oxides, but not for 75 8, oxides. Lower critical fields were observed when experiments were done with high fluences during each successive step. This implies that oxide defects play an important role in breakdown from heavy ions and that breakdown occurs more readily when an ion strike occurs close to a defect site. Critical fields for 75 8, oxides are low enough to allow gate rupture to occur at normal supply voltages for ions with high LET. I
Metal Oxide Semiconductor (MOS) capacitors with ultra-thin oxides have been irradiated with ionising...
When a thin oxide is subjected to heavy ion irradiation, a large leakage current similar to the soft...
We briefly review the most important degradation mechanisms affecting ultra-thin gate oxides after e...
We investigated the combined effect of heavy-ion irradiation and large applied bias on the dielectri...
The enhancement of gate leakage current after exposure to ionising radiation is generally believed t...
Single event gate rupture (SEGR) is a catastrophic failure mode that occurs in dielectric materials ...
We investigated how ultra-thin gate oxides subjected to heavy ion irradiation react to subsequent el...
INVITED PAPER We have briefly reviewed the most important degradation mechanisms affecting ultra-thi...
Gate oxide electric fields are expected to increase to greater than 5 MV/cm as feature size approach...
An accelerated wear-out of ultra-thin gate oxides used in contemporary deep-submicron CMOS technolog...
We present new experimental data about the radiation-induced breakdown in 1.7 mn gate oxides, typica...
We have briefly reviewed the most important degradation mechanisms affecting ultra-thin gate oxides ...
In this work we show that electrical stresses produce HB or Soft Breakdown (SB) in ion irradiated ox...
We have briefly reviewed the most important degradation mechanisms affecting ultra-thin gate oxides ...
We present the first experimental data about the response of partially (PD) and fully (FD) depleted ...
Metal Oxide Semiconductor (MOS) capacitors with ultra-thin oxides have been irradiated with ionising...
When a thin oxide is subjected to heavy ion irradiation, a large leakage current similar to the soft...
We briefly review the most important degradation mechanisms affecting ultra-thin gate oxides after e...
We investigated the combined effect of heavy-ion irradiation and large applied bias on the dielectri...
The enhancement of gate leakage current after exposure to ionising radiation is generally believed t...
Single event gate rupture (SEGR) is a catastrophic failure mode that occurs in dielectric materials ...
We investigated how ultra-thin gate oxides subjected to heavy ion irradiation react to subsequent el...
INVITED PAPER We have briefly reviewed the most important degradation mechanisms affecting ultra-thi...
Gate oxide electric fields are expected to increase to greater than 5 MV/cm as feature size approach...
An accelerated wear-out of ultra-thin gate oxides used in contemporary deep-submicron CMOS technolog...
We present new experimental data about the radiation-induced breakdown in 1.7 mn gate oxides, typica...
We have briefly reviewed the most important degradation mechanisms affecting ultra-thin gate oxides ...
In this work we show that electrical stresses produce HB or Soft Breakdown (SB) in ion irradiated ox...
We have briefly reviewed the most important degradation mechanisms affecting ultra-thin gate oxides ...
We present the first experimental data about the response of partially (PD) and fully (FD) depleted ...
Metal Oxide Semiconductor (MOS) capacitors with ultra-thin oxides have been irradiated with ionising...
When a thin oxide is subjected to heavy ion irradiation, a large leakage current similar to the soft...
We briefly review the most important degradation mechanisms affecting ultra-thin gate oxides after e...