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and chemical stability, as well as good insulating properties. compound thin films such as TiO2 and TiN. Generally, high flows of the reactive gases such as oxygen and nitrogen deposition parameters on the structural and optical proper-films on Si(100) and micro cover glass substrates using radio frequency (RF) magnetron sputtering to understand the role of the difference of substrates as well as reactive gas position parameters Thin Solid Films 475 (2005are required for formation of Ti compound films duringDue to its high refractive index and optical transmittance in the visible range, TiO2 is especially suitable as material for optical coatings and protective layers for very large-scale integrated circuits [1,2]. The bulk material of TiO2 is well known to have three main phases, namely, rutile, anatase, and brookite. Rutile is a high temperature-stable phase and has a refractive index of about 2.7, while anatase is formed at lowe