ABSTRACT High dielectric constant materials, as TiO2 thin films, are considered attractive materials for high-density dynamic-memory applications. Dielectric properties of thin films are influenced by impurities doping. These properties have been investigated on ITO/TiO2/Au structures for a large domain of signal frequencies: 102Hz-106Hz. At 100 Hz, the dielectric constant increase from 83.6 for the undoped sample, to 108, by doping with Fe. The dependence of dielectric loss versus frequency was also examined
International audienceThe influence of phases and phase's boundaries of TiO2 and Ta2O5 in the dielec...
Ultra-thin high-k TiO2 (~11 nm) films have been deposited on strained-Si/relaxed-SiGe heterolayers u...
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...
The dielectric properties of TiO2 thin films have been investigated on ITO/TiO2/Au structures for a ...
International audienceIn this letter, the dielectric properties of rutile TiO2 thin films are studie...
The present study discusses the effect of iron doping in TiO2 thin films deposited by rf sputtering....
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...
Electrochemical impedance spectroscopy measurements of pulsed laser deposited single crystal anatase...
The frequency dependent electrical properties, [dielectrics] of TiO2/CoO core-shell thin films have ...
Impedance characteristics of 27 nm thick anatase TiO2 films showing bistable resistive switching wer...
High dielectric constant TiO2 thin films are promising for gate insulator in 100-nm microelectronic ...
© 2022, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Spri...
A new mechanism to account for the anomalously large dielectric loss and apparent dielectric constan...
HfTiOx films deposited on TiN, Pt and Al2O3/Si bottom electrodes (BE) by Atomic Layer Deposition (AI...
In the current study, TiO2-based thick film varistors (TFVs) doped with 2.5 mol% Ta and various conc...
International audienceThe influence of phases and phase's boundaries of TiO2 and Ta2O5 in the dielec...
Ultra-thin high-k TiO2 (~11 nm) films have been deposited on strained-Si/relaxed-SiGe heterolayers u...
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...
The dielectric properties of TiO2 thin films have been investigated on ITO/TiO2/Au structures for a ...
International audienceIn this letter, the dielectric properties of rutile TiO2 thin films are studie...
The present study discusses the effect of iron doping in TiO2 thin films deposited by rf sputtering....
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...
Electrochemical impedance spectroscopy measurements of pulsed laser deposited single crystal anatase...
The frequency dependent electrical properties, [dielectrics] of TiO2/CoO core-shell thin films have ...
Impedance characteristics of 27 nm thick anatase TiO2 films showing bistable resistive switching wer...
High dielectric constant TiO2 thin films are promising for gate insulator in 100-nm microelectronic ...
© 2022, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Spri...
A new mechanism to account for the anomalously large dielectric loss and apparent dielectric constan...
HfTiOx films deposited on TiN, Pt and Al2O3/Si bottom electrodes (BE) by Atomic Layer Deposition (AI...
In the current study, TiO2-based thick film varistors (TFVs) doped with 2.5 mol% Ta and various conc...
International audienceThe influence of phases and phase's boundaries of TiO2 and Ta2O5 in the dielec...
Ultra-thin high-k TiO2 (~11 nm) films have been deposited on strained-Si/relaxed-SiGe heterolayers u...
[[abstract]](TiO2)x – (Ta2O5)1 – x thin films were prepared with radio-frequency magnetron sputterin...