The trend in deep-submicron integrated circuit design is towards reduced line widths together with larger die size, greater number of interconnect layers and GHz clock frequencies. It is estimated that, within 10 years from now, a single chip will contain over 10 kilometers of total wire-length. As a consequence, the complex interconnect structures of such ICs will highly influence the electrical behavior of the IC and will increas
creased microelectronic device densities and speeds. However, interconnection technology has not ad-...
The number of transistors in integrated circuits is exponentially increasing over time, as predicted...
117 p.Increased use of technology in day to day life for seamless activity and increased living comf...
The roots of this book, and of the new research field that it defines, lie in the scaling of VLSI te...
Global interconnect is commonly regarded as a key potential bottleneck to the advancing performance ...
Interconnect has become the dominating factor in determining circuit performance and reliability in ...
Due to continually shrinking feature sizes, higher clock frequencies, and the simultaneous growth in...
In semiconductor industry, device feature dimension has been continuously scaled down to reduce devi...
A comprehensive review of challenges and potential solutions associated with the impact of downscali...
Concern about the performance of wires in scaled technologies has led to research exploring other co...
acute problem in the interconnect area as IC feature sizes continually scale below 32 nm. When the c...
Continuing VLSI technology scaling raises several deep submicron (DSM) problems like relatively slow...
In this paper, we quantify the impact of global interconnect optimi-zation techniques that address s...
The recent electronics revolution has been fueled by the decades-long trend of exponential growth in...
In many wire-limited VLSI digital systems the time delay of the longest global interconnect can be a...
creased microelectronic device densities and speeds. However, interconnection technology has not ad-...
The number of transistors in integrated circuits is exponentially increasing over time, as predicted...
117 p.Increased use of technology in day to day life for seamless activity and increased living comf...
The roots of this book, and of the new research field that it defines, lie in the scaling of VLSI te...
Global interconnect is commonly regarded as a key potential bottleneck to the advancing performance ...
Interconnect has become the dominating factor in determining circuit performance and reliability in ...
Due to continually shrinking feature sizes, higher clock frequencies, and the simultaneous growth in...
In semiconductor industry, device feature dimension has been continuously scaled down to reduce devi...
A comprehensive review of challenges and potential solutions associated with the impact of downscali...
Concern about the performance of wires in scaled technologies has led to research exploring other co...
acute problem in the interconnect area as IC feature sizes continually scale below 32 nm. When the c...
Continuing VLSI technology scaling raises several deep submicron (DSM) problems like relatively slow...
In this paper, we quantify the impact of global interconnect optimi-zation techniques that address s...
The recent electronics revolution has been fueled by the decades-long trend of exponential growth in...
In many wire-limited VLSI digital systems the time delay of the longest global interconnect can be a...
creased microelectronic device densities and speeds. However, interconnection technology has not ad-...
The number of transistors in integrated circuits is exponentially increasing over time, as predicted...
117 p.Increased use of technology in day to day life for seamless activity and increased living comf...