This paper presents a novel gate sizing methodology to mini-mize the leakage power in the presence of process variations. The leakage and delay are modeled as posynomials functions to formulate a geometric programming problem. The exist-ing statistical leakage model of [18] is extended to include the variations in gate sizes as well as systematic variations. We propose techniques to efficiently evaluate constraints on the α-percentile of the path delays without enumerating the paths in the circuit. The complexity of evaluating the ob-jective function is O(|N |2) and that of evaluating the delay constraints is O(|N | + |E|) for a circuit with |N | gates and |E | wires. The optimization problem is then solved using a convex optimization algor...
The continuous scaling down of transistor feature size poses several challenges to integrated circui...
Abstract—Gate sizing has a significant impact on the de-lay, power dissipation, and area of the fina...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...
With the increased significance of leakage power and performance variability, the yield of a design ...
Abstract In this paper, we approach the gate sizing problem in VLSI circuits in the context of incr...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
DoctorAggressive technology scaling makes the process variations a significant problem in VLSI desig...
Increasing levels of process variability in sub-100nm CMOS design has become a critical concern for ...
Gate sizing in VLSI design is a widely-used method for power or area recovery subject to timing cons...
This paper describes an algorithm for simultaneous gate sizing and fanout optimization along the tim...
Power dissipation is quickly becoming one of the most important limiters in nanometer IC design for ...
Process variations result in a considerable spread in the frequency of the fabricated chips. In high...
The continuous scaling down of transistor feature size poses several challenges to integrated circui...
Process and device scaling in late-CMOS technologies highlight leakage power as a critical challenge...
The continuous scaling down of transistor feature size poses several challenges to integrated circui...
Abstract—Gate sizing has a significant impact on the de-lay, power dissipation, and area of the fina...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...
With the increased significance of leakage power and performance variability, the yield of a design ...
Abstract In this paper, we approach the gate sizing problem in VLSI circuits in the context of incr...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
Technology scaling has taken circuit performance to unprecedented levels in the deep submicron regim...
DoctorAggressive technology scaling makes the process variations a significant problem in VLSI desig...
Increasing levels of process variability in sub-100nm CMOS design has become a critical concern for ...
Gate sizing in VLSI design is a widely-used method for power or area recovery subject to timing cons...
This paper describes an algorithm for simultaneous gate sizing and fanout optimization along the tim...
Power dissipation is quickly becoming one of the most important limiters in nanometer IC design for ...
Process variations result in a considerable spread in the frequency of the fabricated chips. In high...
The continuous scaling down of transistor feature size poses several challenges to integrated circui...
Process and device scaling in late-CMOS technologies highlight leakage power as a critical challenge...
The continuous scaling down of transistor feature size poses several challenges to integrated circui...
Abstract—Gate sizing has a significant impact on the de-lay, power dissipation, and area of the fina...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...