Abstract — We propose techniques for accurate and compu-tationally viable estimation of timing yield using circuit-level Monte Carlo simulation. Our techniques are based on well-known variance reduction approaches from Monte Carlo simulation literature. By adapting these techniques to the yield estimation problem, one can reduce the number of Monte Carlo samples required in order to estimate yield within a desired accuracy. As a result, the same accuracy can be obtained with much fewer circuit-level simulations. The variance reduction techniques we use require a cheap approximation to circuit delay to guide the choice of Monte Carlo samples. For this purpose, we use the logical effort approximation to compute path delays. Most yield estimat...
In nanometer complementary metal-oxide-semiconductor technologies, worst-case design methods and res...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Abstract—Variations of process parameters have an important impact on reliability and yield in deep ...
Abstract—This paper presents novel techniques for timing yield optimization and for yield estimation...
Monte Carlo analysis has so far been the corner stone for analog statistical simulations. Fast and a...
Abstract—As process variations become a significant problem in deep sub-micron technology, a shift f...
In deep-submicrometer technologies, process variability challenges the design of high yield integrat...
Increasing levels of process variation in current technologies have a major impact on power and perf...
Manufacturing process variations, leading to variability in circuit delay, can cause excessive timin...
Yield estimation for analog integrated circuits remains a time consuming operation in variation-awar...
The undesired uncertainties in circuit performance can lead to analog/mixed-signal circuit failures ...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...
Abstract—with technology scaling down to 90nm and below, process variation has become a primary chal...
Accurate timing analysis of digital integrated circuits is becoming harder to achieve with current a...
In nanometer complementary metal-oxide-semiconductor technologies, worst-case design methods and res...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Abstract—Variations of process parameters have an important impact on reliability and yield in deep ...
Abstract—This paper presents novel techniques for timing yield optimization and for yield estimation...
Monte Carlo analysis has so far been the corner stone for analog statistical simulations. Fast and a...
Abstract—As process variations become a significant problem in deep sub-micron technology, a shift f...
In deep-submicrometer technologies, process variability challenges the design of high yield integrat...
Increasing levels of process variation in current technologies have a major impact on power and perf...
Manufacturing process variations, leading to variability in circuit delay, can cause excessive timin...
Yield estimation for analog integrated circuits remains a time consuming operation in variation-awar...
The undesired uncertainties in circuit performance can lead to analog/mixed-signal circuit failures ...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...
Abstract—with technology scaling down to 90nm and below, process variation has become a primary chal...
Accurate timing analysis of digital integrated circuits is becoming harder to achieve with current a...
In nanometer complementary metal-oxide-semiconductor technologies, worst-case design methods and res...
In nanoscale digital CMOS IC design, the large technology parameter variations have boosted the inte...
Abstract—Variations of process parameters have an important impact on reliability and yield in deep ...